Browsing by author "Zyulkov, Ivan"
Now showing items 1-17 of 17
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An investigation of disilane-digermane precursors combination for low temperature SiGe epitaxy
Hikavyy, Andriy; Zyulkov, Ivan; Loo, Roger (2015) -
Area-selective ALD of Ru on nanometer-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films
Zyulkov, Ivan; Madhivala, Viraj; Voronina, Ekaterina; Snelgrove, Matthew; Bogan, Justin; O'Connor, Rob; De Gendt, Stefan; Armini, Silvia (2020) -
Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions
Armini, Silvia; Zyulkov, Ivan (2018) -
Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions
Armini, Silvia; Zyulkov, Ivan; Herregods, Sebastiaan; Struyf, Herbert (2018) -
Area-selective deposition by surface engineering for applications in nanoelectronics. From blanket to confined dimensions
Armini, Silvia; Zyulkov, Ivan; Herregods, Sebastiaan; Struyf, Herbert (2018) -
Area-selective grafting of siloxane molecules on low-k dielectric with respect to copper surface
Rezvanov, Askar; Zyulkov, Ivan; Gornev, E. S.; de Marneffe, Jean-Francois; Armini, Silvia (2018) -
Area-selective Ru ALD by amorphous carbon modification using H plasma: from atomistic modeling to full wafer process integration
Zyulkov, Ivan; Voronina, Ekaterina; Krishtab, Mikhail; Voloshin, Dmitry; Chan, BT; Mankelevich, Yuri; Rakhimova, Tatyana; Armini, Silvia; De Gendt, Stefan (2020) -
Area-selective Ru-ALD by amorphous carbon modification using H radicals
Zyulkov, Ivan; Voronina,; Voloshin,; Chan, BT; Manchelevich,; Rachimova,; Armini, Silvia; De Gendt, Stefan (2019) -
Characterisation of electroless deposited cobalt by hard and soft X-ray photoemission spectroscopy
Brady-Boyd, Anita; O'Connor, Rob; Armini, Silvia; Zyulkov, Ivan; Selvaraju, V; Hughes, G; Bogan, Justin (2018) -
High sensitivity Rutherford backscattering spectrometry using multidetector digital pulse processing
Laricchiuta, Grazia; Vandervorst, Wilfried; Zyulkov, Ivan; Armini, Silvia; Meersschaut, Johan (2018) -
Ruthenium Atomic Layer Deposition (ALD)-enabled selectivity of Cobalt Electroless Layer Deposition (ELD) on dielectrics
Zyulkov, Ivan; Krishtab, Mikhail; De Gendt, Stefan; Armini, Silvia (2016) -
Selective electroless deposition of cobalt using amino-terminated SAMs
Zyulkov, Ivan; Armini, Silvia; Opsomer, Karl; Detavernier, Christophe; De Gendt, Stefan (2019) -
Selective Ru ALD as a catalyst for sub 7nm bottom-up metal interconnects
Zyulkov, Ivan; Krishtab, Mikhail; De Gendt, Stefan; Armini, Silvia (2017) -
Self-assembled monolayers as ALD Ru growth inhibitor in an area-selective bottom-up metallization scheme
Zyulkov, Ivan; Madhiwala, Viraj; De Gendt, Stefan; Armini, Silvia (2019) -
Strained SiGe layers growth with digermane/disilane recursors combination
Zyulkov, Ivan; Hikavyy, Andriy (2014) -
Understanding the interaction mechanisms between amorphous carbon sacrificial patterning material and H2 plasma to enable area-selective ALD processes
Zyulkov, Ivan; Voronina, Ekaterina; Chan, BT; Rakhimova, Tatyana; De Gendt, Stefan; Armini, Silvia (2019) -
Use of high order precursors for manufacturing Gate all around devices
Hikavyy, Andriy; Zyulkov, Ivan; Mertens, Hans; Witters, Liesbeth; Loo, Roger; Horiguchi, Naoto (2017)