Browsing by author "Vangoidsenhoven, Diziana"
Now showing items 1-20 of 24
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15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, I.; Kimura, Y.; Wiaux, Vincent; Boullart, Werner (2013) -
248nm and 193nm lithography for damascene patterning
Maenhoudt, Mireille; Pollentier, Ivan; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2001) -
Advanced optical lithography: double patterning options for 32 and 22nm node
Vandeweyer, Tom; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Gronheid, Roel; Versluijs, Janko; Miller, Andy; Bekaert, Joost; Truffert, Vincent; Wiaux, Vincent (2009) -
Alternative double patterning processes: ready for (sub) 32nm hp
Wong, Patrick; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Wiaux, Vincent (2009) -
Alternative process schemes for double patterning that eliminate the intermediate etch step
Maenhoudt, Mireille; Gronheid, Roel; Stepanenko, Nickolay; Matsuda, Takashi; Vangoidsenhoven, Diziana (2008) -
Back-end, low-k dielectric compatible resist rework procedure
Reybrouck, Mario; Vangoidsenhoven, Diziana; Maenhoudt, Mireille; Van Aelst, Joke; Boullart, Werner (2002) -
Comparison of LFLE and LELE manufacturability
Miller, Andy; Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Murdoch, Gayle; Shioya, Takeo; Hoshiko, Kenji (2008) -
Double patterning process development at IMEC
Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Vandeweyer, Tom; Gronheid, Roel; Versluijs, Janko; Miller, Andy (2008) -
Double patterning process with resist freezing technique
Hoshiko, Kenji; Shioya, Takeo; Fujiwara, Koichi; Yamaguchi, Yoshikazu; Shimokawa, Tsutomu; Maenhoudt, Mireille; Miller, Andy; Vangoidsenhoven, Diziana (2008) -
Dual damascene back-end patterning using 248nm and 193nm lithography
Pollentier, Ivan; Maenhoudt, Mireille; Wiaux, Vincent; Vangoidsenhoven, Diziana; Ronse, Kurt (2000) -
Exploration of EUV-based self-aligned multipatterning (SAMP) options targeting pitches below 20 nm
Decoster, Stefan; Lazzarino, Frederic; Vangoidsenhoven, Diziana; Blanco, Victor; Tamaddon, Amir-Hossein; Kesters, Els; Lorant, Christophe (2019) -
Exploring double patterning approaches for 22-nm half-pitch gate structures
Locorotondo, Sabrina; Vangoidsenhoven, Diziana; Wouters, Johan M. D.; Miller, Andy; Demand, Marc; Boullart, Werner (2008) -
Fabrication and room temperature characterization of trilayer junctions for the development of 300 mm compatible superconducting qubits
Wan, Danny; Couet, Sebastien; Piao, Xiaoyu; Souriau, Laurent; Tsvetanova, Diana; Vangoidsenhoven, Diziana; Thiam, Arame; Pacco, Antoine; Potocnik, Anton; Mongillo, Massimo; Ivanov, Tsvetan; Jussot, Julien; Verjauw, Jeroen; Acharya, Rohith; Heijlen, Jeroen; Donadio, Gabriele Luca; Govoreanu, Bogdan; Lazzarino, Frederic; Radu, Iuliana (2020) -
Fabrication and room temperature characterization of trilayer junctions for the development of superconducting qubits on 300 mm wafers
Wan, Danny; Couet, Sebastien; Piao, Xiaoyu; Souriau, Laurent; Canvel, Yann; Tsvetanova, Diana; Vangoidsenhoven, Diziana; Thiam, Arame; Pacco, Antoine; Potocnik, Anton; Mongillo, Massimo; Ivanov, Tsvetan; Jussot, Julien; Verjauw, Jeroen; Acharya, Rohith; Lazzarino, Frederic; Govoreanu, Bogdan; Radu, Iuliana (2021) -
Fabrication of superconducting resonators in a 300 mm pilot line for quantum technologies
Wan, Danny; Swerts, Johan; Souriau, Laurent; Burnett, Jonathan; Piao, Xiaoyu; Mongillo, Massimo; Verjauw, Jeroen; Potocnik, Anton; Thiam, Arame; Jussot, Julien; Vangoidsenhoven, Diziana; Pacco, Antoine; Kudra, Marina; Niepce, David; Ivanov, Tsvetan; Boccardi, Guillaume; Mocuta, Dan; Bylander, Jonas; Radu, Iuliana (2019) -
Investigation of forming and its controllability in novel HfO2-based 1T1R 40nm-crossbar RRAM cells
Govoreanu, Bogdan; Kubicek, Stefan; Kar, Gouri Sankar; Chen, Yangyin; Paraschiv, Vasile; Rakowski, Michal; Degraeve, Robin; Goux, Ludovic; Clima, Sergiu; Jossart, Nico; Adelmann, Christoph; Richard, Olivier; Raes, Thomas; Vangoidsenhoven, Diziana; Vandeweyer, Tom; Tielens, Hilde; Kellens, Kristof; Devriendt, Katia; Heylen, Nancy; Brus, Stephan; Verbrugge, Beatrijs; Pantisano, Luigi; Bender, Hugo; Pourtois, Geoffrey; Kittl, Jorge; Wouters, Dirk; Altimime, Laith; Jurczak, Gosia (2011) -
Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, Isabelle; Kimura, Yoshie; Wiaux, Vincent; Boullart, Werner (2013-09) -
Lithography aspects of dual damascene interconnect technology
Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Pollentier, Ivan; Ronse, Kurt; Lepage, Muriel; Struyf, Herbert; Van Hove, Marleen (2001) -
Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
Beynet, Julien; Wong, Patrick; Miller, Andy; Locorotondo, Sabrina; Vangoidsenhoven, Diziana; Yoon, Tae-Ho; Demand, Marc; Park, Hyung-Sang; Vandeweyer, Tom; Sprey, Hessel; Yoo, Yong-Min; Maenhoudt, Mireille (2009) -
Spacer defined double patterning for (sub-)20nm half pitch single damascene structures
Versluijs, Janko; Siew, Yong Kong; Kunnen, Eddy; Vangoidsenhoven, Diziana; Demuynck, Steven; Wiaux, Vincent; Dekkers, Harold; Beyer, Gerald (2011)