Browsing by author "Stesmans, Andre"
Now showing items 1-20 of 200
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6Å EOT Si0.45Ge0.55 pMOSFET with optimized reliability (VDD=1V): Meeting the NBTI lifetime target at ultra-thin EOT
Franco, Jacopo; Kaczer, Ben; Eneman, Geert; Mitard, Jerome; Stesmans, Andre; Afanasiev, Valeri; Kauerauf, Thomas; Roussel, Philippe; Toledano-Luque, Maria; Cho, Moon Ju; Degraeve, Robin; Grasser, Tibor; Ragnarsson, Lars-Ake; Witters, Liesbeth; Tseng, Joshua; Takeoka, Shinji; Wang, Wei-E; Hoffmann, Thomas Y.; Groeseneken, Guido (2010) -
A deep level transient spectroscopy study of hole traps in GexSe1-x-based layers for ovonic threshold switching selectors
Hsu, Brent; Simoen, Eddy; Lin, Dennis; Stesmans, Andre; Goux, Ludovic; Delhougne, Romain; Kar, Gouri Sankar (2019) -
A deep level transient spectroscopy study of hole traps in GexSe1-x-based layers for ovonic threshold switching selectors
Hsu, Brent; Simoen, Eddy; Lin, Dennis; Stesmans, Andre; Goux, Ludovic; Delhougne, Romain; Carolan, Patrick; Bender, Hugo; Kar, Gouri Sankar (2020) -
A first-principles study of the structural and electronic properties of III-V/thermal oxide interfaces
Scarrozza, Marco; Pourtois, Geoffrey; Houssa, Michel; Caymax, Matty; Stesmans, Andre; Meuris, Marc; Heyns, Marc (2009) -
A microstructural study of the thermal stability of atomic layer deposited Al2O3 thin films
Nistor, L.; Richard, Olivier; Zhao, Chao; Bender, Hugo; Stesmans, Andre; Van Tendeloo, G. (2003-04) -
A theoretical study of the initial oxidation of the GaAs(001)-beta2(2x4) surface
Scarrozza, Marco; Pourtois, Geoffrey; Houssa, Michel; Caymax, Matty; Stesmans, Andre; Meuris, Marc; Heyns, Marc (2009) -
Adsorption of molecular oxygen on the reconstructed beta2(2x4)-GaAs(001) surface: a first-principles study
Scarrozza, Marco; Pourtois, Geoffrey; Houssa, Michel; Caymax, Matty; Meuris, Marc; Heyns, Marc; Stesmans, Andre (2009) -
An electric field tunable energy band gap at silicene/(0001) ZnS interfaces
Houssa, Michel; van den Broek, Bas; Scalise, Emilio; Pourtois, Geoffrey; Afanasiev, Valeri; Stesmans, Andre (2013) -
Analysis of charge pumping characteristics of single interface traps
Habas, Predrag; De Wolf, Ingrid; Groeseneken, Guido; Stesmans, Andre; Maes, Herman (1997) -
Analysis of transferred MoS2 layers grown by MOCVD: evidence of Mo vacancy related defect formation
Schoenaers, Ben; Leonhardt, Alessandra; Nalin Mehta, Ankit; Stesmans, Andre; Chiappe, Daniele; Asselberghs, Inge; Radu, Iuliana; Huyghebaert, Cedric; De Gendt, Stefan; Houssa, Michel; Afanas'ev, Valeri V. (2020) -
Atomic and electrical characterisation of amorphous silicon passivation layers
O'Sullivan, Barry; Thoan, N.H.; Jivanescu, M.; Pantisano, Luigi; Bearda, Twan; Dross, Frederic; Gordon, Ivan; Afanasiev, Valeri; Stesmans, Andre; Poortmans, Jef (2012) -
Atomic layer deposition of high-k dielectric layers on Ge and III-V MOS channels
Delabie, Annelies; Alian, AliReza; Bellenger, Florence; Brammertz, Guy; Brunco, David; Caymax, Matty; Conard, Thierry; Franquet, Alexis; Houssa, Michel; Sioncke, Sonja; Van Elshocht, Sven; van Hemmen, J.L.; Keuning, W.; Kessels, W.M.M.; Afanas'ev, V.V.; Stesmans, Andre; Heyns, Marc; Meuris, Marc (2008) -
Atomic layer deposition of high-k dielectric layers on Ge and III-V MOS channels
Delabie, Annelies; Caymax, Matty; Bellenger, Florence; Brammertz, Guy; Conard, Thierry; Houssa, Michel; Sioncke, Sonja; Van Elshocht, Sven; Heyns, Marc; Meuris, Marc; Brunco, David; van Hemmen, J.L.; Keuning, W.; Kessels, W.M.M.; Afanas'ev, V.V.; Stesmans, Andre (2008) -
Band alignment and effective work function of atomiclayer deposited VO2 and V2O5 films on SiO2 and Al2O3
Cerbu, Florin; Chou, H.S.; Radu, Iuliana; Martens, Koen; Peter, Antony; Afanasev, Valeri; Stesmans, Andre (2015) -
Band alignment and electron traps in Y2O3 layers on (100) Si
Wang, Wan Chih; Badylevitch, M.; Afanasiev, Valeri; Stesmans, Andre; Adelmann, Christoph; Van Elshocht, Sven; Kittl, Jorge; Lukosius, M.; Walczyk, Ch.; Wenger, Ch. (2009) -
Band alignment at interfaces of amorphous Al2O3 with Ge1-xSnx-strained Ge-based channels
Chou, H.-Y; Afanas'ev, Valeri; Houssa, Michel; Stesmans, Andre; Vincent, Benjamin; Gencarelli, Federica; Shimura, Yosuke; Merckling, Clement; Loo, Roger; Nakatsuka, Osamu; Zaima, Shigeaki (2014) -
Band alignment at the interface of (100)Si with HfxTa1-xOy high-k dielectric layers
Afanasiev, Valeri; Stesmans, Andre; Zhao, Chao; Caymax, Matty; Rittersma, Z.M.; Maes, Jan (2005) -
Band alignment at the interfaces of Al2O3 and ZrO2-based insulators with metals and Si
Afanas'ev, V. V.; Houssa, Michel; Stesmans, Andre; Heyns, Marc (2001) -
Band alignment at the interfaces of Al2O3 and ZrO2-based insulators with metals and Si
Houssa, Michel; Stesmans, Andre; Adriaenssens, G. J.; Heyns, Marc (2002) -
Band alignment between (100)Si and complex rare earth/transition metal oxides
Afanasiev, Valeri; Stesmans, Andre; Zhao, Chao; Caymax, Matty; Heeg, T.; Schubert, J.; Jia, Y.; Schlom, D.G.; Lucovsky, G. (2004)