Browsing by author "Young, Edward"
Now showing items 21-35 of 35
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Miscibility of amorphous ZrO2-Al2O3 binary alloy
Zhao, Chao; Richard, Olivier; Bender, Hugo; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Young, Edward; Roebben, G.; Van Der Biest, O.; Haukka, S. (2002) -
Performance comparison of sub 1nm sputtered TiN/HfO2 nMOS and pMOSFETs
Tsai, Wilman; Ragnarsson, Lars-Ake; Pantisano, Luigi; Chen, P.; Onsia, Bart; Schram, Tom; Cartier, E.; Kerber, Andreas; Young, Edward; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2003-12) -
Plasma modification of Hf based high-k dielectrics: effect of nitridation and silicon nitride deposition
Tsai, W.; Maes, J.W.; De Witte, Hilde; Chen, J.; Delabie, Annelies; Carter, Richard; Richard, Olivier; Caymax, Matty; Conard, Thierry; Young, Edward; De Gendt, Stefan (2004) -
Scaling of Hf-based gate dielectrics - integration with polysilicon gates
De Gendt, Stefan; Caymax, Matty; Chen, Jerry; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kaushik, Vidya; Kerber, Andreas; Kubicek, Stefan; Niwa, Masaaki; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Schram, Tom; Shimamoto, Yasuhiro; Tsai, Wilman; Röhr, Erika; Van Elshocht, Sven; Witters, Thomas; Young, Edward; Zhao, Chao; Heyns, Marc (2003) -
Scaling of HF-based gate dielectrics - intgeration with polysilicon gates
De Gendt, Stefan; Caymax, Matty; Chen, J.; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kaushik, Vidya; Kerber, Andreas; Kubicek, Stefan; Niwa, M.; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Schram, Tom; Shimamoto, Yasuhiro; Tsai, Wilman; Rohr, Erika; Van Elshocht, Sven; Vandervorst, Wilfried; Witters, Thomas; Young, Edward; Zhao, Chao; Heyns, Marc (2004) -
Scaling of high-k dielectrics towards sub-1nm EOT
Heyns, Marc; Beckx, Stephan; Bender, Hugo; Blomme, Pieter; Boullart, Werner; Brijs, Bert; Carter, Richard; Caymax, Matty; Claes, Martine; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Henson, Kirklen; Kauerauf, Thomas; Kubicek, Stefan; Lucci, Luca; Lujan, Guilherme; Mentens, Jimmy; Pantisano, Luigi; Petry, Jasmine; Richard, Olivier; Röhr, Erika; Schram, Tom; Vandervorst, Wilfried; Van Doorne, Patrick; Van Elshocht, Sven; Westlinder, Jörgen; Witters, Thomas; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Green, Martin; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, Steven; Tsai, Wilman; Young, Edward; Manabe, Yukiko; Shimamoto, Yasuhiro; Bajolet, Philippe; De Witte, Hilde; Maes, Jan; Date, Lucien; Pique, Didier; Coenegrachts, Bart; Vertommen, Johan; Passefort, Sophie (2003) -
Stabilization of amorphous structures in ALCVD high-k oxide layers
Zhao, Chao; Richard, Olivier; Bender, Hugo; Young, Edward; Carter, Richard; Tsai, Wilman; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Roebben, G.; Van der Biest, O.; Maes, Jos; Tuominen, Marko; Haukka, S. (2001) -
Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Tsai, Wilman; Carter, Richard; Nohira, Hiroshi; Caymax, Matty; Conard, Thierry; Cosnier, Vincent; De Gendt, Stefan; Heyns, Marc; Petry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; Maes, Jan; Tuominen, M.; Schulte, W.H.; Garfunkel, E.; Gustafsson, T. (2003) -
The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration
Kaushik, Vidya; De Gendt, Stefan; Carter, Richard; Claes, Martine; Röhr, Erika; Pantisano, Luigi; Kluth, Jon; Kerber, Andreas; Cosnier, Vincent; Cartier, Eduard; Tsai, Wilman; Young, Edward; Green, Martin; Chen, Jerry; Jang, S.A.; Lin, S.; Delabie, Annelies; Van Elshocht, Sven; Manabe, Yukiko; Richard, Olivier; Zhao, Chao; Bender, Hugo; Caymax, Matty; Heyns, Marc (2003) -
Thermal processing of high-K materials thermodynamics and kinetics
Young, Edward; Chen, Jian; Cosnier, Vincent; Lysaght, P.; Maes, Jan; Roozeboom, F.; Zhao, Chao (2002) -
Thermal stability and scalability of zr-aluminate-based high-k gate stacks
Chen, Jerry; Cartier, Eduard; Carter, Richard; Kauerauf, Thomas; Zhao, Chao; Pétry, Jasmine; Cosnier, Vincent; Xu, Zhen; Kerber, Andreas; Tsai, Wilman; Young, Edward; Kubicek, Stefan; Caymax, Matty; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Copel, M.; Besling, Wim; Bajolet, Philippe; Maes, Jan (2002) -
Thermal stability of high k layers
Zhao, Chao; Cosnier, V.; Chen, P.J.; Richard, Olivier; Roebben, G.; Maes, Jan; Van Elshocht, Sven; Bender, Hugo; Young, Edward; Van der Biest, O.; Caymax, Matty; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc (2003) -
Thermostability of amorphous zirconium aluminate high-K layers
Zhao, Chao; Richard, Olivier; Young, Edward; Bender, Hugo; Roebben, G.; Haukka, S.; De Gendt, Stefan; Houssa, Michel; Carter, Richard; Tsai, Wilman; Van Ber Biest, O.; Heyns, Marc (2002) -
Tunneling 1/fg noise in 5nm HfO2/2.1 nm SiO2 gate stack n-MOSFETs
Simoen, Eddy; Mercha, Abdelkarim; Pantisano, Luigi; Claeys, Cor; Young, Edward (2005) -
Tunnelling 1/fy noise in 5nm HfO2/2.1 nm SiO2 gate stack n-MOSFETs
Simoen, Eddy; Mercha, Abdelkarim; Pantisano, Luigi; Claeys, Cor; Young, Edward (2004)