Browsing by author "Kutrzeba Kotowska, Bogumila"

Now showing items 1-9 of 9

    • Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers 

      Lariviere, Stephane; Wilson, Chris; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Beral, Christophe; Van Den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryan Ryoung han; McIntyre, Greg; Ronse, Kurt; Boemmels, Juergen; Tokei, Zsolt; Mocuta, Dan (2018)

    • Fabrication challenges in integrating self-assembled block copolymer process in semiconductor devices 

      Seema Saseendran, Sandeep; Paneri, Abhilash; Tobback, Bert; Kutrzeba Kotowska, Bogumila; Vecchio, Emma; Jamieson, Geraldine; Paraschiv, Vasile; Figeys, Bruno; Suh, Hyo Seon; Sabuncuoglu Tezcan, Deniz; Takahashi, Kohei; Fujikane, Masaki; Himeno, Atsushi; Nakamura, Kunihiko; Tambo, Naoki; Nakata, Yuki; Tanaka, Hiroyuki; Naito, Yasuyuki (2020)

    • N5 BEOL process options patterning flows comparing 193immersion to hybrid EUV or full EUV 

      Lariviere, Stephane; Briggs, Basoene; Wilson, Chris; Mallik, Arindam; Decoster, Stefan; Wan, Danny; Bekaert, Joost; Blanco, Victor; Mao, Ming; Paolillo, Sara; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Boemmels, Juergen; Trivkovic, Darko; Tokei, Zsolt; McIntyre, Greg; Mocuta, Dan (2017)

    • Plasmonic multispectral color filters by self-aligned nano-imprinted gratings 

      Lodewijks, Kristof; Mareddi, Bharathkumar; Qin, Rongchen; De Proft, Anabel; Figeys, Bruno; Willegems, Myriam; Jansen, Roelof; Rottenberg, Xavier; Storace, Eleonora; Kutrzeba Kotowska, Bogumila (2022-06-15)

    • SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform 

      Bekaert, Joost; Di Lorenzo, Paolo; Mao, Ming; Decoster, Stefan; Lariviere, Stephane; Franke, Joern-Holger; Blanco, Victor; Kutrzeba Kotowska, Bogumila; Lazzarino, Frederic; Gallagher, Emily; Hendrickx, Eric; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Maslow, Mark; Timoshkov, Vadim; Kiers, Ton (2017)

    • Scalable Patterning Modules for Diffractive Optics on 300 mm Substrates 

      Traub, Matt; Willegems, Myriam; Thirumalai, Sundar; Smout, Steve; Asbahi, Mohamed; Kutrzeba Kotowska, Bogumila; Lenci, Silvia; Storace, Eleonora (2023)

    • Single exposure EUV patterning for BEOL metal layers on the imec iN7 platform 

      Blanco, Victor; Bekaert, Joost; Mao, Ming; Kutrzeba Kotowska, Bogumila; Lariviere, Stephane; Ciofi, Ivan; Baert, Rogier; Kim, Ryan Ryoung han; Gallagher, Emily; Hendrickx, Eric; Tan, Ling Ee; Gillijns, Werner; Trivkovic, Darko; Leray, Philippe; Halder, Sandip; Gallagher, Matt; Lazzarino, Frederic; Paolillo, Sara; Wan, Danny; Mallik, Arindam; Sherazi, Yasser; McIntyre, Greg; Dusa, Mircea; Rusu, Paul; Hollink, Thijs; Fliervoet, Timon; Wittebrood, Friso (2017)

    • Subtractive etch of ruthenium for sub-5nm interconnect 

      Wan, Danny; Paolillo, Sara; Rassoul, Nouredine; Kutrzeba Kotowska, Bogumila; Blanco, Victor; Adelmann, Christoph; Lazzarino, Frederic; Ercken, Monique; Murdoch, Gayle; Boemmels, Juergen; Wilson, Chris; Tokei, Zsolt (2018)

    • The imec iN7 EUV platform: M2-Block and Via patterning developments 

      Bekaert, Joost; Franke, Joern-Holger; Mao, Ming; Lariviere, Stephane; Decoster, Stefan; Di Lorenzo, Paolo; Kutrzeba Kotowska, Bogumila; Blanco, Victor; Hendrickx, Eric; Gallagher, Emily; Leray, Philippe; Kim, Ryan Ryoung han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Timoshkov, Vadim; Kiers, Ton; Maslow, Mark (2016)