Browsing by author "Vrancken, Evi"
Now showing items 1-20 of 34
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A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation
Grillaert, Joost; Heylen, Nancy; Vrancken, Evi; Badenes, Gonçal; Rooyackers, Rita; Meuris, Marc; Heyns, Marc (1998) -
Cleaning, rinsing and drying aspects in post-Cu-CMP clean
Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Heyns, Marc (1999) -
Cleaning, rinsing and drying effects in post-Cu CMP clean
Fyen, Wim; Vos, Rita; Teerlinck, Ivo; Vrancken, Evi; Grillaert, Joost; Meuris, Marc; Mertens, Paul; Heyns, Marc (2000) -
Cleaning, rinsing and drying issues in post-Cu CMP cleaning: a case study
Fyen, Wim; Vos, Rita; Vrancken, Evi; Grillaert, J.; Meuris, Marc; Heyns, Marc (2002) -
CMOS compatible metal contacts for GaN-on-Si lght emitting diodes
Cavaco, Celso; Rosmeulen, Maarten; Motsnyi, Vasyl; Vrancken, Evi; Osman, Haris (2012) -
Comparative study of Ni-silicide and Co-silicide for sub 0.25-μm technologies
Lauwers, A.; Besser, Paul; Gutt, T.; Satta, Alessandra; de Potter de ten Broeck, Muriel; Lindsay, Richard; Roelandts, Nico; Loosen, Fred; Jin, S.; Bender, Hugo; Stucchi, Michele; Vrancken, Evi; Deweerdt, Bruno; Maex, Karen (2000) -
Defect inspection of Cu metallization
Holsteyns, Frank; Carbonell, Laure; Vos, Ingrid; Vrancken, Evi; Tokei, Zsolt; Mertens, Paul (2002) -
Effect of CMP slurry filtration on wafer defectivity
Devriendt, Katia; Meuris, Marc; Heylen, Nancy; Vrancken, Evi; Grillaert, Joost; Heyns, Marc; Ling, Zhi Ming (1998) -
Etch rate study of germanium, GaAs, and InGaAs: a challenge in semiconductor processing.
Sioncke, Sonja; Brunco, David; Meuris, Marc; Van Steenbergen, Jan; Vrancken, Evi; Heyns, Marc (2008) -
Etch rates of Ge, GaAs and InGaAs in acids, bases and peroxide based mixtures
Sioncke, Sonja; Brunco, David; Meuris, Marc; Uwamahoro, Olivier; Van Steenbergen, Jan; Vrancken, Evi; Heyns, Marc (2008) -
Etching Ge, GaAs and InGaAs: A challenge in semiconductor processing
Sioncke, Sonja; Brunco, David; Meuris, Marc; Van Steenbergen, Jan; Vrancken, Evi; Heyns, Marc (2008) -
Ge FETs gate stack passivation options and their scalability to low EOT
Bellenger, Florence; De Jaeger, Brice; Nyns, Laura; Zahid, Mohammed; Houssa, Michel; Vrancken, Evi; Tseng, Joshua; Caymax, Matty; Meuris, Marc; De Meyer, Kristin; Heyns, Marc; Hoffmann, Thomas Y. (2010) -
Germanium MOSFET devices: advances in materials understanding, process development, and electrical performance
Brunco, David; De Jaeger, Brice; Eneman, Geert; Mitard, Jerome; Hellings, Geert; Satta, Alessandra; Terzieva, Valentina; Souriau, Laurent; Leys, Frederik; Pourtois, Geoffrey; Houssa, Michel; Winderickx, Gillis; Vrancken, Evi; Sioncke, Sonja; Opsomer, Karl; Nicholas, Gareth; Caymax, Matty; Stesmans, Andre; Van Steenbergen, Jan; Mertens, Paul; Meuris, Marc; Heyns, Marc (2008) -
Growth techniques for high breakdown voltage in GaN/AlGaN HEMT on 200 mm Si (111) substrate by MOVPE
Liang, Hu; Saripalli, Yoga; Van Hove, Marleen; Kang, Xuanwu; Vrancken, Evi; Zhao, Ming; Kandaswamy, Prem Kumar; Decoutere, Stefaan; Langer, Robert (2014) -
High FET performance for a future CMOS GeO2-based technology
Bellenger, Florence; De Jaeger, Brice; Merckling, Clement; Houssa, Michel; Penaud, Julien; Nyns, Laura; Vrancken, Evi; Caymax, Matty; Meuris, Marc; Hoffmann, Thomas Y.; De Meyer, Kristin; Heyns, Marc (2010) -
High hole mobility in 65 nm strained Ge p-channel field effect transistors with HfO2 gate dielectric
Mitard, Jerome; De Jaeger, Brice; Eneman, Geert; Dobbie, Andrew; Myronov, M.; Kobayashi, Masaharu; Geypen, Jef; Bender, Hugo; Vincent, Benjamin; Krom, Raymond; Franco, Jacopo; Winderickx, Gillis; Vrancken, Evi; Vanherle, Wendy; Wang, Wei-E; Tseng, Joshua; Loo, Roger; De Meyer, Kristin; Caymax, Matty; Pantisano, Luigi; Leadley, D.R; Meuris, Marc; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2011) -
High hole-mobility 65nm biaxially-strained Ge-pFETs: fabrication, analysis and optimization
Mitard, Jerome; De Jaeger, Brice; Eneman, Geert; Dobbie, Andrew; Myronov, M.; Kobayashi, Masaharu; Geypen, Jef; Bender, Hugo; Vincent, Benjamin; Krom, Raymond; Franco, Jacopo; Winderickx, Gillis; Vrancken, Evi; Vanherle, Wendy; Wang, Wei-E; Tseng, Joshua; Loo, Roger; De Meyer, Kristin; Caymax, Matty; Pantisano, Luigi; Leadley, David; Meuris, Marc; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2010) -
Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI
Mitard, Jerome; Shea, C.; De Jaeger, Brice; Pristera, Andrea; Wang, Gang; Houssa, Michel; Eneman, Geert; Hellings, Geert; Wang, Wei-E; Lin, J.C.; Leys, Frederik; Loo, Roger; Winderickx, Gillis; Vrancken, Evi; Stesmans, Andre; De Meyer, Kristin; Caymax, Matty; Pantisano, Luigi; Meuris, Marc; Heyns, Marc (2009) -
Influence of the height difference between the first and second nitride layer on erosion and dishing in the dual nitride approach for shallow trench isolation
Heylen, Nancy; Grillaert, Joost; Vrancken, Evi; Badenes, Gonçal; Rooyackers, Rita; Meuris, Marc; Heyns, Marc (1998) -
Investigation of the electrical properties of Ge/high-k gate stack: GeO2 VS Si-cap
Mitard, Jerome; Bellenger, Florence; Witters, Liesbeth; De Jaeger, Brice; Vincent, Benjamin; Nyns, Laura; Martens, Koen; Vrancken, Evi; Wang, Gang; Lin, Dennis; Loo, Roger; Caymax, Matty; De Meyer, Kristin; Heyns, Marc; Horiguchi, Naoto (2011)