Browsing by author "Abell, Thomas"

A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

Travaly, Youssef; Schuhmacher, Jorg; Baklanov, Mikhaïl; Giangrandi, Simone; Richard, Olivier; Brijs, Bert; Van Hove, Marleen; Maex, Karen; Abell, Thomas; Somers, K.R.F; Hendrickx, M.F.A; Vanquickenborne, L.G.; Ceulemans, A.; Jonas, A.M (2005-10)

Atomic layer deposited barriers for copper interconnects

Schuhmacher, Jorg; Martin Hoyas, Ana; Ernur, Didem; Tokei, Zsolt; Travaly, Youssef; Bruynseraede, Christophe; Satta, Alessandra; Whelan, Caroline; Shamiryan, Denis; Beyer, Gerald; Abell, Thomas; Sutcliffe, Victor; Schaekers, Marc; Maex, Karen (2004)

Atomic layer deposition of barriers for interconnect

Besling, Wim; Satta, Alessandra; Schuhmacher, Jörg; Abell, Thomas; Sutcliffe, Victor; Martin Hoyas, Ana; Beyer, Gerald; Gravesteijn, Dirk; Maex, Karen (2002)

Buckling instabilities of thin cap layers deposited onto low-k dielectric films

Iacopi, Francesca; Brongersma, Sywert; Maex, Karen; Abell, Thomas (2002)

Buckling instabilities of thin cap layers deposited onto low-k dielectric films

Iacopi, Francesca; Brongersma, Sywert; Abell, Thomas; Maex, Karen (2003)

Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material

Travaly, Youssef; Kemeling, N.; Maenhoudt, Mireille; Peeters, S.; Tokei, Zsolt; Abell, Thomas; Schuhmacher, Jörg; Turturro, S.; Vos, Ingrid; Eugene, Lino; Matsuki, N.; Fukazawa, A.; Goundar, K.; Satoh, K.; Kato, M.; Kaneko, S.; Vertommen, Johan; Sprey, Hessel; Van Hove, Marleen; Jonas, A.; Maex, Karen (2004)

Comparison of modulus and density measurements by nanoidentation, SAWS, XRR and EP techniques of a porous low k MSQ dielectric

Abell, Thomas; Iacopi, Francesca; Prokopowicz, Greg; Sun, Brad; Mazurenko, Alex; Travaly, Youssef; Baklanov, Mikhaïl; Jonas, Alain; Sullivan, Chris; Brongersma, Sywert; Liou, Huey-Chiang; Tower, Josua; Gostein, Michael; Gallagher, Mike; Calvert, Jeff; Moinpour, Mansour; Maex, Karen (2005-01)

Correlation between solvent diffusion, porosity and pore sealing for low k dielectrics

Abell, Thomas; Shamiryan, Denis; Patz, Matthias; Maex, Karen (2003)

Correlation between solvent diffusion, porosity and pore sealing for low k dielectrics

Abell, Thomas; Shamiryan, Denis; Patz, Matthias; Maex, Karen (2004)

Damage minimized plasma pore sealing of microporous low k dielectrics

Abell, Thomas; Maex, Karen (2004)

Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films

Iacopi, Francesca; Waldfried, Carlo; Abell, Thomas; Guyer, Eric; Eyckens, Brenda; Travaly, Youssef; Sajavaara, Timo; Gage, David M.; Beyer, Gerald; Berry, Ivan; Dauskardt, Reinhold; Maex, Karen (2005)

Efficient pore sealing crucial for future interconnects

Van Bavel, Mieke; Beyer, Gerald; Iacopi, Francesca; Abell, Thomas; Shamiryan, Denis; Maex, Karen (2004)

Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity

Travaly, Youssef; Schuhmacher, Jorg; Martin Hoyas, Ana; Van Hove, Marleen; Maex, Karen; Abell, Thomas; Sutcliffe, Victor; Jonas, A.M. (2005-04)

Interface characterization of nanoscale laminate structures on dense dielectric substrates by X-ray reflectivity

Travaly, Youssef; Schuhmacher, Jorg; Martin Hoyas, Ana; Van Hove, Marleen; Maex, Karen; Abell, Thomas; Sutcliffe, Victor; Jonas, Alain M. (2005-04)

Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure

Abell, Thomas; Schuhmacher, Jorg; Tokei, Zsolt; Travaly, Youssef; Maex, Karen (2005)

Low-k dielectric materials

Shamiryan, Denis; Abell, Thomas; Iacopi, Francesca; Maex, Karen (2004)

Nucleation and growth dependence of ALD WNC on substrate surface condition

Abell, Thomas; Schuhmacher, Jörg; Travaly, Youssef; Maex, Karen (2004)

Opportunities and challenges for integration of ALD barrier layers in damascene process flows

Sprey, Hessel; Schuhmacher, Jorg; Travaly, Youssef; Sutcliffe, Victor; Abell, Thomas; Bastings, Hans; Stokhof, Maarten; Haukka, Suvi; Li, Wei-Min; Beyer, Gerald; Raaijmakers, Ivo (2004)

Pinhole density measurements of barriers deposited on low-k films

Shamiryan, Denis; Abell, Thomas; Le, Quoc Toan; Maex, Karen (2003-11)

Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy

Abell, Thomas; Shamiryan, Denis; Schuhmacher, Jörg; Besling, W.; Sutcliffe, V.; Maex, Karen (2003)