Browsing by author "Maekawa, Kaoru"
Now showing items 1-9 of 9
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Cryo-etching for integration in micro-electronic : Silicon deep etch for contact and low-k integration in Back end of line (BEOL)
Chanson, Romain; Lefaucheux, Philippe; Dussart, Remi; Shen, Peng; Urabe, Keiichiro; Dussarat, Christian; Maekawa, Kaoru; yatsuda, koichi; Tahara, Shigeru; de Marneffe, Jean-Francois (2017) -
Cryoetching processes applied to ULK material
Leroy, Floriane; Tillocher, Thomas; Lefaucheux, Philippe; Dussart, Remi; yatsuda, koichi; Maekawa, Kaoru; Dussarat, Christian; Zhang, Liping; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2015) -
Low damage cryoetching of low-K materials
Dussart, Remi; Tillocher, Thomas; Leroy, Floriane; Lefaucheux, Philippe; yatsuda, koichi; Maekawa, Kaoru; Nishimura, Eiichi; Zhang, Liping; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2015) -
Low damage ULK etching by means of high boiling point organic condensation
Chanson, Romain; Holtzer, Nicolas; Lefaucheux, Philippe; Dussart, Rémi; SHEN, Peng; URABE, Keiichiro; Dussarat, Christian; Maekawa, Kaoru; yatsuda, koichi; Tahara, Shigeru; de Marneffe, Jean-Francois (2017) -
Low-k material cryoetch using high boiling point organic compounds to reduce plasma induced damage
Chanson, Romain; Tillocher, Thomas; Lefaucheux, Philippe; Dussart, Remi; Zhang, Liping; de Marneffe, Jean-Francois; Shen, P; Dussarrat, Chrsitian; Maekawa, Kaoru; yatsuda, koichi; Tahara, Shigeru (2018) -
Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation
Zhang, Liping; de Marneffe, Jean-Francois; Leroy, Florian; Lefaucheux, Philippe; Tillocher, Thomas; Dussart, Remi; Maekawa, Kaoru; yatsuda, koichi; Dussarrat, Christian; Goodyear, Andy; Cooke, Mike; De Gendt, Stefan; Baklanov, Mikhaïl (2016) -
Novel volatile film for the protection of organo-silicate glass dielectric materials
Fujikawa, Makoto; Yamaguchi, Tatsuya; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru; Kawasaki, H.; Chanson, Romain; de Marneffe, Jean-Francois (2019) -
Paths towards low-damage etching of highly porous organo-silicate low-k dielectrics
de Marneffe, Jean-Francois; Zhang, Liping; Watanabe, Mitsuhiro; yatsuda, koichi; Maekawa, Kaoru; Cooke, Mike; Goodyear, Andy; Leroy, Floriane; Tillocher, Thomas; Lefaucheux, Philippe; Dussart, Remi; Dussarat, Christian; Baklanov, Mikhaïl (2016) -
Use of a thermally degradable chemical vapor deposited polymer film for low damage plasma processing of highly porous dielectrics
de Marneffe, Jean-Francois; Yamaguchi, Tatsuya; Fujikawa, Makoto; Rezvanov, Askar; Chanson, Romain; Zhang, Jianran; Babaei Gavan, Khashayar; El Otell, Ziad; Nozawa, S.; Kikuchi, Y.; Maekawa, Kaoru (2019)