Browsing by author "Zotovich, Alexey"
Now showing items 1-7 of 7
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Advanced etching for nanodevices and 2D materials
de Marneffe, Jean-Francois; Cooke, Mike; Goodyear, Andy; Braithwaite, Nicolas; Sutton, Yvonne; Bowden, Mark; Altamirano Sanchez, Efrain; Zotovich, Alexey; El Otell, Ziad; Chan, BT; Knoll, Armin; Rawlings, Colin; Duerig, Urs; Spiesser, Martin; Kaestner, Marcus; Neuber, Christian; Rangelow, Ivo (2016) -
Comparative analysis of the factors leading to low-k degradation during the integration process
Zotovich, Alexey; Krishtab, Mikhail; Lazzarino, Frederic; Baklanov, Mikhaïl (2014) -
Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Zotovich, Alexey; El Otell, Ziad; de Marneffe, Jean-Francois; Proshina, Olga; Lopaev, Dimitri; Rakhimova, Tatyana; Baklanov, Mikhaïl (2016) -
Improved plasma resistance for porous low-k dielectrics by pore stuffing approach
Zhang, Liping; de Marneffe, Jean-Francois; Heyne, Markus; Naumov, Sergej; Sun, Yiting; Zotovich, Alexey; El Otell, Ziad; Vaida, Selim; De Gendt, Stefan; Baklanov, Mikhaïl (2015) -
Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach
Zotovich, Alexey; Rezvanov, Askar; Chanson, Romain; Zhang, L.; Hacker, N.; Kurchikov, K.; Klimin, S.; Zyryanov, S. M.; Lopaev, Dimitri; Gornev, E.; Clemente, I.; Miakonkikh, A.; Maslakov, K. (2018) -
Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas
Zotovich, Alexey; El Otell, Ziad; Sutton, Yvonne; Braithwaite, N. St. J.; de Marneffe, Jean-Francois; Baklanov, Mikhail (2016) -
Vacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials
El Otell, Ziad; Samara, Vladimir; Zotovich, Alexey; Hansen, Terje; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2015)