Browsing by author "Lepage, Muriel"
Now showing items 1-11 of 11
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Applying a thin imaging resist system to substrates with topography
Neisser, M.; Grosev, G.; Maenhoudt, Mireille; Lepage, Muriel; Struyf, Herbert (2000) -
Characterization and integration in Cu damascene structures of AURORA, an inorganic low-k dielectric
Alves Donaton, Ricardo; Coenegrachts, Bart; Sleeckx, Erik; Schaekers, Marc; Sophie, Guus; Matsuki, N.; Baklanov, Mikhaïl; Struyf, Herbert; Lepage, Muriel; Vanhaelemeersch, Serge; Beyer, Gerald; Stucchi, Michele; De Roest, David; Maex, Karen (2001) -
Characterization and integration of a new Si-O-C film deposited by CVD
Alves Donaton, Ricardo; Struyf, Herbert; Lepage, Muriel; Coenegrachts, Bart; Stucchi, Michele; De Roest, David; Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Xia, L. Q.; Lim, T. H.; Gotuaco, M.; Yieh, E.; Van Autryve, Luc (2001) -
Dry etch and clean aspects for advanced integration of low k dielectrics
Vanhaelemeersch, Serge; Struyf, Herbert; Alaerts, Carine; Baklanov, Mikhaïl; Lepage, Muriel (2000) -
Lithography as a critical step for low-k dual damascene: from 248nm to 193nm
Ronse, Kurt; Maenhoudt, Mireille; Pollentier, Ivan; Wiaux, Vincent; Struyf, Herbert; Lepage, Muriel; Vanhaelemeersch, Serge (2000) -
Lithography aspects of dual damascene interconnect technology
Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Pollentier, Ivan; Ronse, Kurt; Lepage, Muriel; Struyf, Herbert; Van Hove, Marleen (2001) -
Material characteristics and damascene patterning of a fluoropolymer low-k film
Struyf, Herbert; Donaton, R. A.; Lepage, Muriel; Lanckmans, Filip; Vereecke, Guy; Maex, Karen; Vanhaelemeersch, Serge; Scheid, D. (2000) -
Optimization of etching and stripping chemistries for Z3MS TM low-k
Lepage, Muriel; Shamiryan, Denis; Baklanov, Mikhaïl; Struyf, Herbert; Mannaert, Geert; Vanhaelemeersch, Serge; Weidner, Ken; Meynen, Herman (2001) -
Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films
Alves Donaton, Ricardo; Iacopi, Francesca; Baklanov, Mikhaïl; Shamiryan, Denis; Coenegrachts, Bart; Struyf, Herbert; Lepage, Muriel; Meuris, Marc; Van Hove, Marleen; Gray, William; Meynen, Herman; De Roest, David; Vanhaelemeersch, Serge; Maex, Karen (2000) -
Process optimization and integration of trimethylsilane-deposited a-SiC:H and a-SiCO:H dielectric thin films for damascene processing
Gray, W.D.; Loboda, M.J.; Bremmer, J.N.; Struyf, Herbert; Lepage, Muriel; Van Hove, Marleen; Alves Donaton, Ricardo; Sleeckx, Erik; Stucchi, Michele; Lanckmans, Filip; Gao, Teng; Boullart, Werner; Coenegrachts, Bart; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Meynen, H.; Maex, Karen (2003) -
Studies on XLK film characterization and integration in copper damascene processes
Iacopi, Francesca; Alves Donaton, Ricardo; Coenegrachts, Bart; Komiya, Takayuki; Struyf, Herbert; Lepage, Muriel; Van Aelst, Joke; Boullart, Werner; De Roest, David; Vos, Ingrid; Baklanov, Mikhaïl; Vereecke, Guy; Van Hove, Marleen; Stucchi, Michele; Tokei, Zsolt; Meynen, Herman; Bremmer, J. N.; Vanhaelemeersch, Serge; Maex, Karen (2001)