Browsing by author "Cowern, N.E.B."
Now showing items 1-10 of 10
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Advanced front-end processes for the 45nm CMOS technology node
Collart, E.J.H.; Felch, S.B.; Graoui, H.; Tallavarjula, S.; Lindsay, Richard; Pawlak, Bartek; van den Berg, J.A.; Cowern, N.E.B.; Kirby, K.J. (2004) -
B profile alteration by annealing in reactive ambients
Pawlak, Bartek; Cowern, N.E.B.; Vandervorst, Wilfried (2009) -
Current understanding and modeling of B diffusion and activation anomalies in preamporphized ultra-shallow junctions
Colombeau, B.; Smith, A.J.; Cowern, N.E.B.; Cristiano, F.; Claverie, A.; Duffy, Ray; Pawlak, Bartek; Ortiz, C.J.; Pichler, P.; Lampin, E.; Zechner, C. (2004) -
Effect of amorphization on activation and deactivation of boron in source/drain, channel and poly gate
Pawlak, Bartek; Duffy, Ray; Janssens, Tom; Vandervorst, Wilfried; Severi, Simone; Richard, Olivier; Benedetti, Alessandro; Eyben, Pierre; Colombeau, B.; Cowern, N.E.B.; Camillo-Castillo, R.A.; Jones, K.S.; Aboy, M. (2005) -
Evidence on the mechanism of boron deactivation in Ge-preamorphized ultrashallow junctions
Pawlak, Bartek; Surdeanu, Radu; Colombeau, B.; Smith, A.J.; Cowern, N.E.B.; Lindsay, Richard; Vandervorst, Wilfried; Brijs, Bert; Richard, Olivier; Cristiano, F. (2004) -
Local traps as nanoscale reaction-diffusion probes: B clustering in c-Si
Hantschel, Thomas; Pawlak, B.J.; Cowern, N.E.B.; Ahn, C.; Vandervorst, Wilfried; Gwilliam, R.; van Berkum, J.G.M. (2014) -
On the activation mechanisms of sub-melt laser anneals
Clarysse, Trudo; Bogdanowicz, Janusz; Goossens, Jozefien; Moussa, Alain; Rosseel, Erik; Vandervorst, Wilfried; Petersen, D.H.; Lin, R.; Nielsen, P.F.; Hansen, O.; Defranoux, C.; Vertikov, A.; Gostein, M.; Bennett, N.S.; Cowern, N.E.B.; Faifer, V.N. (2008) -
On the analysis of the activation mechanisms of sub-melt laser anneals
Clarysse, Trudo; Bogdanowicz, Janusz; Goossens, Jozefien; Moussa, Alain; Rosseel, Erik; Vandervorst, Wilfried; Petersen, Dirch; Lin, Rong; Nielsen, P.F.; Hansen, Ole; Merklin, G.; Bennett, N.S.; Cowern, N.E.B. (2008) -
The role of preamorphization and activation for ultra shallow junction formation on strained Si layers grown on SiGe buffer
Pawlak, Bartek; Vandervorst, Wilfried; Lindsay, Richard; De Wolf, Ingrid; Roozeboom, F.; Delhougne, Romain; Benedetti, Alessandro; Loo, Roger; Caymax, Matty; Maex, Karen; Cowern, N.E.B. (2004) -
The role of preamorphization and activation for ultra shallow junction formation on strained Si layers grown on SiGe buffer
Pawlak, Bartek; Vandervorst, Wilfried; Lindsay, Richard; De Wolf, Ingrid; Roozeboom, F.; Delhougne, Romain; Benedetti, Alessandro; Loo, Roger; Caymax, Matty; Maex, Karen; Cowern, N.E.B. (2004)