Browsing by author "Ferchichi, Abdelkarim"
Now showing items 1-14 of 14
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Effect of bake/cure temperature of an advanced organic ultra low-k material on the interface adhesion strength to metal barriers
Vanstreels, Kris; Pantouvaki, Marianna; Ferchichi, Abdelkarim; Verdonck, Patrick; Conard, Thierry; Ono, Yukiharu; Matsutani, Mihoko; Nakatani, Koji; Baklanov, Mikhaïl (2011) -
Engineering of chemical and physical properties of low-k materials by different wavelength of UV light
Baklanov, Mikhaïl; Marsik, Premysl; Verdonck, Patrick; Ferchichi, Abdelkarim; Urbanowicz, Adam; Prager, L.; De Roest, D.; Mechri, C. (2008) -
Evaluation of an advanced organic ultra-low-k material
Ferchichi, Abdelkarim; Travaly, Youssef; Carbonell, Laure; Vanstreels, Kris; Beyer, Gerald; Baklanov, Mikhaïl; Asakuma, S.; Nakajima, M. (2009) -
Evaluation of an advanced organic ultra-low-k material
Ferchichi, Abdelkarim; Travaly, Youssef; Beyer, Gerald; Baklanov, Mikhaïl; Vanstreels, Kris (2008) -
Impact of plasma exposure on organic low-k materials
Smirnov, Evgeny; Ferchichi, Abdelkarim; Huffman, Craig; Baklanov, Mikhaïl (2010) -
Improved low-k dielectric properties using He/H2 plasma for resist removal
Urbanowicz, Adam; Shamiryan, Denis; Marsik, Premysl; Travaly, Youssef; Verdonck, Patrick; Vanstreels, Kris; Ferchichi, Abdelkarim; De Roest, David; Sprey, Hessel; Matsushita, K.; Kaneko, S.; Tsuji, N.; Luo, S.; Escorcia, O.; Berry, Ivan; Waldfried, Carlo; De Gendt, Stefan; Baklanov, Mikhaïl (2008) -
Improved low-k dielectric properties using He/H2 plasma for resist removal
Urbanowicz, Adam; Shamiryan, Denis; Marsik, Premysl; Travaly, Youssef; Jonas, Alain; Verdonck, Patrick; Vanstreels, Kris; Ferchichi, Abdelkarim; De Roest, David; Sprey, Hessel; Matsushita, Kiyohiro; Kaneko, Shinya; Tsuji, Naoto; Luo, Shijian; Escorcia, Orlando; Berry, Ivan; Waldfried, Carlo; De Gendt, Stefan; Baklanov, Mikhaïl (2009) -
Influence of the ion bombardment of O2 plasmas on low-k materials
Verdonck, Patrick; Samara, Vladimir; Goodyear, Alec; Ferchichi, Abdelkarim; Van Besien, Els; Baklanov, Mikhaïl; Braithwaite, Nicholas (2011) -
Integration of an organic ultra low-k (k=2.2) material
Pantouvaki, Marianna; Zhao, Larry; Huffman, Craig; Heylen, Nancy; Ferchichi, Abdelkarim; Ono, Y.; Nakajima, M.; Nakatani, K.; Struyf, Herbert; Beyer, Gerald; Baklanov, Mikhaïl (2009) -
Integration of an organic ultra low-k (k=2.2) material
Pantouvaki, Marianna; Zhao, Larry; Huffman, Craig; Heylen, Nancy; Ferchichi, Abdelkarim; Ono, Y.; Nakajima, M.; Nakatani, K.; Struyf, Herbert; Beyer, Gerald; Baklanov, Mikhaïl (2010) -
Plasma damage and restoration of CVD low-k materials
Smirnov, Evgeny; Ferchichi, Abdelkarim; Zhao, Larry; Baklanov, Mikhaïl (2009) -
Process compatibility of new advanced low-k dielectric
Ferchichi, Abdelkarim; Vanstreels, Kris; Heylen, Nancy; Beyer, Gerald; Baklanov, Mikhaïl; Asakuma, S.; Nakajima, M. (2009) -
The influence of N containing plasmas on low-k films
Verdonck, Patrick; Aresti, Maitane; Ferchichi, Abdelkarim; Van Besien, Els; Stafford, Ben; Trompoukis, Christos; De Roest, David; Baklanov, Mikhaïl (2011) -
The influence of N containing plasmas on low-k films
Verdonck, Patrick; Aresti, Maitane; Ferchichi, Abdelkarim; Van Besien, Els; Stafford, Ben; De Roest, David; Baklanov, Mikhaïl (2010)