Browsing by author "Kerner, Christoph"
Now showing items 21-40 of 47
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Micron-sized planar transformer for electromagnetic flux guidance and confinement
Kerner, Christoph; Magnus, Wim; Golubovic, D.; Van Haesendonck, Chris; Moshchalkov, V. (2004-12) -
Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?
Chiarella, Thomas; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Dittrich, Rok; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Rooyackers, Rita; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009) -
Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?
Mitard, Jerome; Witters, Liesbeth; Mercha, Abdelkarim; Kerner, Christoph; Dittrich, Rok; Rakowski, Michal; Ortolland, Claude; Ragnarsson, Lars-Ake; Parvais, Bertrand; De Keersgieter, An; Kubicek, Stefan; Redolfi, Augusto; Rooyackers, Rita; Vrancken, Christa; Brus, Stephan; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009) -
Novel process to pattern selectively dual dielectric capping layers using soft-mask only
Schram, Tom; Kubicek, Stefan; Rohr, Erika; Brus, Stephan; Vrancken, Christa; Chang, Shou-Zen; Chang, V.S.; Mitsuhashi, Riichiru; Okuno, Yasutoshi; Akheyar, Amal; Cho, Hag-Ju; Hooker, J.C.; Paraschiv, Vasile; Vos, Rita; Sebaai, Farid; Ercken, Monique; Kelkar, Prasad; Delabie, Annelies; Adelmann, Christoph; Witters, Thomas; Ragnarsson, Lars-Ake; Kerner, Christoph; Chiarella, Thomas; Aoulaiche, Marc; Cho, Moon Ju; Kauerauf, Thomas; De Meyer, Kristin; Lauwers, Anne; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge (2008) -
Optimization of HfSiON using a design of experiment (DOE) approach
Rothschild, Aude; Mitsuhashi, Riichirou; Kerner, Christoph; Shi, Xiaoping; Everaert, Jean-Luc; Date, Lucien; Conard, Thierry; Richard, Olivier; Vrancken, Evi; Verbeeck, Rita; Veloso, Anabela; Lauwers, Anne; de Potter de ten Broeck, Muriel; Debusschere, Ingrid; Jurczak, Gosia; Niwa, Masaaki; Absil, Philippe; Biesemans, Serge (2007) -
Optimization of inductive coupling between qbit rings
Kerner, Christoph; Magnus, Wim; Schoenmaker, Wim; Van Haesendonck, Chris (2004) -
Optimized ultra-low thermal budget process flow for advanced high-K / metal gate first CMOS using laser-annealing technology
Ortolland, Claude; Ragnarsson, Lars-Ake; Favia, Paola; Richard, Olivier; Kerner, Christoph; Chiarella, Thomas; Rosseel, Erik; Okuno, Yasutoshi; Akheyar, Amal; Tseng, Joshua; Everaert, Jean-Luc; Schram, Tom; Kubicek, Stefan; Aoulaiche, Marc; Cho, Moon Ju; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2009) -
Optimiztion of inductive coupling between Qbit rings
Kerner, Christoph; Schoenmaker, Wim; Magnus, Wim (2002) -
Performance enhancement of PFET planar devices by plasma immersion ion implantation (P3i)
Ortolland, Claude; Horiguchi, Naoto; Kerner, Christoph; Chiarella, Thomas; Eyben, Pierre; Everaert, Jean-Luc; Agua Borniquel, Jose; Poon, Tse; Santhanam, Kartik; Porshnev, Peter; Foad, Majeed; Schreutelkamp, Robert; Absil, Philippe; Vandervorst, Wilfried; Felch, Susan; Hoffmann, Thomas Y. (2008) -
Photo diode detector with improved series resistance and optimised optical response
Havaldar, Dnyanesh; Lauwers, Anne; Kerner, Christoph; Merry, Billy; Haspeslagh, Luc (2014) -
Production of quantum bits using silicon processing technology
Kerner, Christoph (2004-10) -
Quantized logic switch implementation through a superconducting transformer
Kerner, Christoph; Golubovic, Dusan; Hackens, Benoit; Poli, Stefano; Rens, Gunther; Faniel, Sebastien; Schoenmaker, Wim; Bayot, Vincet; Magnus, Wim; Maes, Herman (2009-05) -
SiCP selective epitaxial growth in recessed source/drain regions yielding to drive current enhancement in n-channel MOSFET
Bauer, Matthias; Machkaoutsan, Vladimir; Zhang, Y.; Weeks, Doran; Spear, Jennifer; Thomas, Shawn; Verheyen, Peter; Kerner, Christoph; Clemente, Francesca; Bender, Hugo; Shamiryan, Denis; Loo, Roger; Hikavyy, Andriy; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge (2008) -
SiCP selective epitaxial growth in recessed source/drain regions yielding to drive current enhancement in n-channel MOSFET
Bauer, M.; Machkaoutsan, V.; Weeks, D.; Zhang, Y.; Thomas, S.G.; Verheyen, Peter; Kerner, Christoph; Clemente, Francesca; Bender, Hugo; Shamiryan, Denis; Loo, Roger; Hoffmann, Thomas; Absil, Philippe; Biesemans, Serge (2008) -
Silicide yield improvement with NiPtSi formation by laser anneal for advanced low power platform CMOS technology
Ortolland, Claude; Rosseel, Erik; Horiguchi, Naoto; Kerner, Christoph; Mertens, Sofie; Kittl, Jorge; Verleysen, Eveline; Bender, Hugo; Vandervorst, Wilfried; Lauwers, Anne; Absil, Philippe; Biesemans, Serge; Mathukrishnan, S.; Srinivasan, S.; Mayur, A.J.; Schreutelkamp, Rob; Hoffmann, Thomas Y. (2009) -
Simple current and capacitance methods for bulk FinFET height extraction
Chiarella, Thomas; Parvais, Bertrand; Horiguchi, Naoto; Togo, Mitsuhiro; Kerner, Christoph; Witters, Liesbeth; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2011-03) -
Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
Veloso, Anabela; Verheyen, Peter; Vos, Rita; Brus, Stephan; Ito, Satoru; Mitsuhashi, Riichirou; Paraschiv, Vasile; Shi, Xiaoping; Onsia, Bart; Arnauts, Sophia; Loo, Roger; Lauwers, Anne; Conard, Thierry; de Marneffe, Jean-Francois; Goossens, Danny; Baute, Debbie; Locorotondo, Sabrina; Chiarella, Thomas; Kerner, Christoph; Vrancken, Christa; Mertens, Sofie; O'Sullivan, Barry; Yu, HongYu; Chang, Shou-Zen; Niwa, Masaaki; Kittl, Jorge; Absil, Philippe; Jurczak, Gosia; Hoffmann, Thomas Y.; Biesemans, Serge (2007) -
Strain enhanced Low-VT CMOS featuring La/Al-doped HfSiO/TaC and 10ps invertor delay
Kubicek, Stefan; Schram, Tom; Rohr, Erika; Paraschiv, Vasile; Vos, Rita; Demand, Marc; Adelmann, Christoph; Witters, Thomas; Nyns, Laura; Delabie, Annelies; Ragnarsson, Lars-Ake; Chiarella, Thomas; Kerner, Christoph; Mercha, Abdelkarim; Parvais, Bertrand; Aoulaiche, Marc; Ortolland, Claude; Yu, HongYu; Veloso, Anabela; Witters, Liesbeth; Singanamalla, Raghunath; Kauerauf, Thomas; Brus, Stephan; Vrancken, Christa; Chang, V.S.; Chang, Shou-Zen; Mitsuhashi, Riichirou; Okuno, Yasutoshi; Akheyar, Amal; Cho, Hag-Ju; Hooker, J.; O'Sullivan, Barry; Van Elshocht, Sven; De Meyer, Kristin; Jurczak, Gosia; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Strain enhanced NMOS using in situ doped embedded Si1-xCx S/D stressors with up to 1.5% substitutional carbon content grown using a novel deposition process
Verheyen, Peter; Machkaoutsan, Vladimir; Bauer, Matthias; Weeks, Doran; Kerner, Christoph; Bender, Hugo; Shamiryan, Denis; Loo, Roger; Hoffmann, Thomas; Absil, Philippe; Biesemans, Serge; Thomas, Shawn G. (2008-06) -
Strain enhanced nMOS using in-situ doped embedded Si:C S/D stressors with up to 1.5% substitutional carbon content grown using a novel deposition process
Verheyen, Peter; Kerner, Christoph; Clemente, Francesca; Bender, Hugo; Shamiryan, Denis; Loo, Roger; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge; Lu, Jiong-Ping; Wise, Rick; Machkaoutsan, Vladimir; Bauer, Matthias; Weeks, Dorian; Thomas, Shawn (2008)