Browsing by author "Wood, Obert"
Now showing items 1-9 of 9
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A method of image-based aberration metrology for EUVL tools
Levinson, Zac; Raghunathan, Sudhar; Verduijn, Erik; Wood, Obert; Mangat, Pawitter; Goldberg, Kenneth; Benk, Markus; Wojdyla, Antoine; Philipsen, Vicky; Hendrickx, Eric; Smith, Bruce (2015) -
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Characterization of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Raghunathan, Sudhar; Wood, Obert; Mangat, Pawitter; Verduijn, Erik; Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Goldberg, Ken; Benk, Marcus; Kearney, Pat; Levinson, Zachary; Smith, Bruce (2014) -
Driving the industry towards a consensus on high numerical aperture (High-NA) extreme ultraviolet (EUV)
Kearney, Patrick; Wood, Obert; Hendrickx, Eric; McIntyre, Greg; Soichi, Inoue; Goodwin, Frank; Wurm, Stephan; Van Schoot, Jan; Kaiser, Winfried (2014) -
Imaging impact of multilayer tuning in EUV masks, experimental validation
Philipsen, Vicky; Hendrickx, Eric; Verduijn, Erik; Raghunathan, Sudhar; Wood, Obert; Soltwisch, Victor; Scholze, Frank; Davydova, Natalia; Mangat, Pawitter (2014) -
Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
Wood, Obert; Wong, Keith; Parks, Valentin; Kearney, Patrick; Meyer-Ilse, Julia; Luong, Vu; Philipsen, Vicky; Faheem, Mohammad; Liang, Yifan; Kumar, Ajay; Chen, Esther; Bennett, Corbin; Bianzhu, Fu; Gribelyuk, Michael; Zhao, Wayne; Mangat, Pawitter; van der Heide, Paul (2016) -
Improving EUV imaging at tighter pitch using a tuned-ML mask stack
Wood, Obert; Philipsen, Vicky; Soltwisch, Victor; Raghunathan, Sudhar; Verduijn, Erik; Hendrickx, Eric; Scholze, Frank; Mangat, Pawitter (2014) -
Modeling EUV mask using alternative materials for mask 3D effect compensation
Luong, Vu; Philipsen, Vicky; Verduijn, Erik; Scholze, Frank; Hendrickx, Eric; Heyns, Marc; Wood, Obert (2015) -
Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials
Luong, Vu; Philipsen, Vicky; Hendrickx, Eric; Scholze, Frank; van de Kruijs, Robbert; Edrisi, Arash; Wood, Obert; Heyns, Marc (2016)