Browsing by author "Simpson, Gavin"
Now showing items 1-8 of 8
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Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance
Wostyn, Kurt; Rondas, Dirk; Loo, Roger; Dhayalan, Sathish Kumar; Hikavyy, Andriy; Elskens, Wim; Vyncke, Alex; Mertens, Paul; Holsteyns, Frank; De Gendt, Stefan; Masaoka, Toru; Yoshida, Yukifumi; Bast, Gerhard; Simpson, Gavin (2015) -
Evaluating SiGe-on-Si epitaxial quality by inline surface light scattering: a case study on the impact of interfacial oxygen
Wostyn, Kurt; Kenis, Karine; Rondas, Dirk; Loo, Roger; Hikavyy, Andriy; Douhard, Bastien; Mertens, Paul; Holsteyns, Frank; De Gendt, Stefan; Simpson, Gavin; Bast, Gerhard; Swaminathan, Karthik (2014) -
Evaluation of post ion-implantation resist strip with the background signal of a light scattering tool
Halder, Sandip; Vos, Rita; Wada, Masayuki; Tsvetanova, Diana; Claes, Martine; Mertens, Paul; Radovanovic, Sanda; Dighe, Prasanna; Amann, Christophe; Simpson, Gavin; Polli, Marco (2010) -
Progress on background signal analysis of bare wafer inspection systems based on light scattering for III/V epitaxial growth monitoring
Halder, Sandip; Mols, Yves; Van Den Heuvel, Dieter; Van Puymbroeck, Jan; Caymax, Matty; Vancoille, Eric; Nieuborg, Nancy; Bast, Gerhard; Simpson, Gavin; Peikert, Milko; Polli, Marco; Ulea, Neli; Seong, Ho Yoo (2014) -
Using the background signal of a light scattering tool for I/I photo resist strip optimization and monitoring
Halder, Sandip; Vos, Rita; Wada, Masayuki; Claes, Martine; Kenis, Karine; Mertens, Paul; Dighe, Prasanna; Radovanovic, Sanda; Simpson, Gavin; Sonnemans, Roger (2010) -
Using the low frequency component of the background signal for SiGe and Ge growth monitoring
Halder, Sandip; Schulze, Andreas; Leray, Philippe; Caymax, Matty; Bast, Gerhard; Simpson, Gavin; Ulea, Neli; Polli, Marco (2015) -
Within-die and within-wafer CMP process characterization and monitoring using PWG Fizeau interferometry system
Teugels, Lieve; Devriendt, Katia; Heylen, Nancy; Tsvetanova, Diana; Struyf, Herbert; Bast, Gerhard; Ramkhalawon, Roshita; Mueller, Dieter; Simpson, Gavin; Ulea, Neli (2016) -
Within-die and within-wafer CMP process characterization and monitoring using PWG Fizeau interferometry system
Teugels, Lieve; Devriendt, Katia; Heylen, Nancy; Tsvetanova, Diana; Struyf, Herbert; Bast, Gerhard; Ramkhalawon, Roshita; Mueller, Dieter; Simpson, Gavin; Ulea, Neli (2016)