Browsing by author "Kovalev, A.S."
Now showing items 1-9 of 9
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1-D model of OSG low-k films modification by EUV/VUV emission
Rakhimova, T.V.; Rakhimov, A.T.; Mankelevich, Y.A.; Lopaev, D.V.; Ziryanov, S.M.; Kovalev, A.S.; Vasil'eva, A.N.; Proshina, O.V.; Braginsky, O.V.; Kurchikov, K.; Baklanov, Mikhaïl (2013) -
Low-k films modification under EUV and VUV radiation
Rakhimova, T.; Rakhimov, A.; Mankelevich, Y.A.; Lopaev, D.V.; Kovalev, A.S.; Vasil'eva, A.N.; Zyryanov, S.M.; Kurchikov, K.; Proshina, O.; Voloshin, D.G.; Novikova, N.N.; Krishtab, Mikhail; Baklanov, Mikhaïl (2014) -
Recombination of O and H atoms with low-k SiOCH films pretreated in He plasma
Baklanov, Mikhaïl; Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Mankelevich, Y.A.; Rakhimova, T.V.; Malykhin, E.M.; Proshina, O.V.; Rakhimov, A.T.; Vasilieva, A.N.; Voloshin, D.G.; Zyryanov, S.M. (2009) -
Recombination probabilities of O and H atoms on the surface of nanoporous low dielectric constant SiCOH films
Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2009) -
Recombination probabilities of O and H atoms on the surface of nanoporous Low-k SiCOH dielectrics
Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2008) -
Spatially resolved dynamics of methyl groups removal from SiOCH films by oxygen atoms. Monte-Carlo model of O atoms behavior in nanoporous material
Mankelevivh, Yu.A.; Braginsky, O.V; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M; Baklanov, Mikhaïl (2010) -
The effect of He plasma treatment on properties of organosilicate glass low-k films
Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Proshina, O.V.; Rakhimova, T.V.; Rakhimov, A.T.; Voloshin, D.G.; Vasilieva, A.N.; Zyryanov, S.M.; Smirnov, Evgeny; Baklanov, Mikhaïl (2011) -
The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials
Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2009) -
The mechanism of low-k SiOCH film modification by oxygen atoms
Braginsky, O.V.; Kovalev, A.S.; Lopaev, D.V.; Malykhin, E.M.; Mankelevich, Y.A.; Rakhimova, T.V.; Rakhimov, A.T.; Vasilieva, A.N.; Zyryanov, S.M.; Baklanov, Mikhaïl (2010)