Browsing by author "Kempsell, Monica"
Now showing items 1-6 of 6
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AIMS TM 45 inspection of CH treated with inverse lithography
Hendrickx, Eric; Birkner, Robert; Kempsell, Monica; Tritchkov, Alexander; Richter, Rigo; Vandenberghe, Geert; Scheruebl, Thomas (2008) -
AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35
Hendrickx, Eric; Birkner, R.; Kempsell, Monica; Tritchkov, A.; Vandenberghe, Geert; Scheruebl, T. (2008) -
Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Sakajiri, Kyohei; Tritchkov, Alexander; Granik, Yuri; Hendrickx, Eric; Vandenberghe, Geert; Kempsell, Monica; Fenger, Germain; Boehm, Klaus; Scheruebl, Thomas (2009) -
Design split algorithms validation for DPT implementation at 32 nm and beyond
Tritchkov, Alexander; Kempsell, Monica; Glotov, Petr; Sahouria, Emile; Komirenko, Sergiy; Wiaux, Vincent (2008) -
Hyper-NA imaging of 45nm node random CH layouts using inverse lithography
Hendrickx, Eric; Tritchkov, Alexander; Sakajiri, Kyohei; Granik, Yuri; Kempsell, Monica; Vandenberghe, Geert (2008) -
Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
Kempsell, Monica; Hendrickx, Eric; Tritchkov, Alexander; Sakajiri, Kyohei; Yasui, Kenichi; Yoshitake, Susuki; Granik, Yuri; Vandenberghe, Geert; Smith, Bruce W. (2009)