Browsing by author "Ong, Patrick"
Now showing items 1-20 of 68
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193nm immersion lithography for high performance silicon photonic circuits
Selvaraja, Shankar; Absil, Philippe; Van Campenhout, Joris; Winroth, Gustaf; Murdoch, Gayle; Locorotondo, Sabrina; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Sterckx, Gunther; Lepage, Guy; Pathak, Shibnath; Bogaerts, Wim; Van Thourhout, Dries; Xie, Weiqiang (2014) -
A 35nm diameter vertical silicon nanowire short-gate tunnelFET
Vandooren, Anne; Rooyackers, Rita; Leonelli, Daniele; Iacopi, Francesca; De Gendt, Stefan; Verhulst, Anne; Heyns, Marc; Kunnen, Eddy; Nguyen, Duy; Demand, Marc; Ong, Patrick; Lee, Willie; Moonens, Jos; Richard, Olivier; Vandenberghe, William; Groeseneken, Guido (2009) -
A 400GHz fMAX fully self-aligned SiGe:C HBT architecture
Van Huylenbroeck, Stefaan; Sibaja-Hernandez, Arturo; Venegas, Rafael; You, Shuzhen; Winderickx, Gillis; Radisic, Dunja; Lee, Willie; Ong, Patrick; Vandeweyer, Tom; Nguyen, Duy; De Meyer, Kristin; Decoutere, Stefaan (2009-10) -
Advanced 300-mm waferscale patterning for silicon photonics devices with record low loss and phase errors
Selvaraja, Shankar; Murdoch, Gayle; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Pathak, Shibnath; Vermeulen, Diedrik; Sterckx, Gunther; Winroth, Gustaf; Verheyen, Peter; Lepage, Guy; Bogaerts, Wim; Baets, Roel; Van Campenhout, Joris; Absil, Philippe (2012) -
An improved CMP process for integration of high mobility channel materials
Teugels, Lieve; Ong, Patrick; Usman Ibrahim, Ansar; Delande, Tinne; Bhonsle, Rithu; Siebert, Max; Garcia Romero, Ivan; Struyf, Herbert; Leunissen, Leonardus (2016) -
An improved CMP process for integration of high mobility channel materials
Teugels, Lieve; Ong, Patrick; Ansar, Sheik; Delande, Tinne; Bhonsle, Rithu; Siebert, Max; Garcia Romero, Ivan; Struyf, Herbert; Leunissen, Leonardus (2016) -
An InGaAs/InP quantum well FinFET using the replacement fin process integrated in an RMG flow on 300mm Si substrates
Waldron, Niamh; Merckling, Clement; Guo, Weiming; Ong, Patrick; Teugels, Lieve; Ansar, Sheikh; Tsvetanova, Diana; Sebaai, Farid; van Dorp, Dennis; Milenin, Alexey; Lin, Dennis; Nyns, Laura; Mitard, Jerome; Pourghaderi, Mohammad Ali; Douhard, Bastien; Richard, Olivier; Bender, Hugo; Boccardi, Guillaume; Caymax, Matty; Heyns, Marc; Vandervorst, Wilfried; Barla, Kathy; Collaert, Nadine; Thean, Aaron (2014) -
Chemical mechanical planarization of patterned InP in shallow trench isolation (STI) template structures using hydrogen peroxide-based silica slurries containing oxalic acid or citric acid
Matovu, John B.; Ong, Patrick; Teugels, Lieve; Leunissen, Peter; Babu, S. V. (2014) -
Chemical mechanical polishing of Ge using colloidal silica particles and H2O2
Ong, Patrick; Peddeti, Shivaji; Leunissen, Peter; Babu, S. V. (2011) -
Chemical mechanical polishing of InP
Ong, Patrick; Peddeti, Shivaji; Leunissen, Peter; Babu, S.V. (2012) -
CMP of Ge and InP for microelectronic applications
Ong, Patrick; Peddeti, Shivaji; Leunissen, Peter; Babu, S.V. (2011) -
CMP of Ge for high mobility channels
Ong, Patrick; Witters, Liesbeth; Leunissen, Peter (2010) -
CMP of novel materials
Ong, Patrick; Kellens, Kristof; Chiodarelli, Nicolo; Meuris, Marc; Leunissen, Peter (2009) -
CMP of novel materials for frontend-of-line and backend-of-line applications
Leunissen, Peter; Ong, Patrick; Teugels, Lieve (2011) -
CMP on SiGe materials - linking chemical and physical properties to design low defect selective slurries
Ong, Patrick; Siebert, Max; Huang, Kevin; Teugels, Lieve; Ansar, Sheik; Leunissen, Peter (2014) -
CMP on SiGe materials – linking chemical and physical properties to design low defect and selective slurries
Ong, Patrick; Siebert, Max; Leunissen, Leonardus H. A.; Ibrahim, Sheikh Ansar Usman; Teugels, Lieve (2014) -
CMP process development for high mobility channel materials
Ong, Patrick; Gillot, C.; Ansar, S.; Noller, B.; Li, Y. (2012) -
CMP process steps for silicon-based photonics integration
Ong, Patrick; Verheyen, Peter; Lepage, Guy; Van Campenhout, Joris; Absil, Philippe (2014) -
CMP processing of high-mobility channel material alternatives to Si
Ong, Patrick; Teugels, Lieve (2016) -
CMP Slurries for germanium substrates in FEOL applications
Ong, Patrick; Siebert, Joerg Max; Noller, Bastian; Lan, Yongqing; Lauter, Michael; Proells, Julian; Huang, Kevin; Usman Ibrahim, Sheik Ansar (2013)