Browsing by author "Stepanenko, Nickolay"
Now showing items 1-12 of 12
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157-nm photoresist process optimization for a full-field scanner
Light, Scott; Stepanenko, Nickolay; Gronheid, Roel; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke (2004-03) -
Alternative process schemes for double patterning that eliminate the intermediate etch step
Maenhoudt, Mireille; Gronheid, Roel; Stepanenko, Nickolay; Matsuda, Takashi; Vangoidsenhoven, Diziana (2008) -
EUV lithography program at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007) -
Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum-UV cleaning
Okoroanyanwu, Uzo; Stepanenko, Nickolay; Vereecke, Guy; Eliat, Astrid; Kocsis, Michael; Kang, Young-Seog; Jonckheere, Rik; Conard, Thierry; Ronse, Kurt (2004) -
Full field EUV lithography turning into reality at IMEC
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Hermans, Jan; Baudemprez, Bart; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Implementing full field EUV lithography using the ADT
Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008) -
Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Jonckheere, Rik; Van Den Heuvel, Dieter; Iwamoto, Fumio; Stepanenko, Nickolay; Myers, Alan; Lamantia, Matthew; Goethals, Mieke; Hendrickx, Eric; Ronse, Kurt (2009) -
Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007) -
Optical path and image performane monitoring of a full-field 157-nm scanner
Wells, Greg; Hermans, Jan; Watso, Robert; Kang, Young-Seog; Morton, Rob; Kocsis, Michael; Okoroanyanwu, Uzo; De Bisschop, Peter; Stepanenko, Nickolay; Ronse, Kurt (2004) -
Progress in full field EUV lithography program at IMEC
Goethals, Mieke; Lorusso, Gian; Jonckheere, Rik; Baudemprez, Bart; Hermans, Jan; Iwamoto, Fumio; Kim, Byeong Soo; Kim, In Sung; Myers, Alan; Niroomand, Ardavan; Stepanenko, Nickolay; Van Roey, Frieda; Pollentier, Ivan; Ronse, Kurt (2007) -
Status of EUV lithography at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Studies of the defectivity formation mechanismes between the top coats and the resists in immersion lithography
Stepanenko, Nickolay; Kishimura, Shinji; Gronheid, Roel; Maenhoudt, Mireille; Ercken, Monique; Kocsis, Michael; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Benndorf, Michael (2005)