Browsing by author "Gogolides, Evangelos"
Now showing items 1-14 of 14
-
Challenges in LER/CDU metrology in DSA: placement error and cross-line correlations
Constantoudis, Vassilios; Kuppuswamy, V.K.M.; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2016) -
Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
Constantoudis, Vassilios; Papvieros, George; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2017) -
Computational nanometrology of line edge roughness: recent challenges and advances
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Gogolides, Evangelos (2017) -
Computational nanometrology of line edge roughness: recent challenges and advances
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Gogolides, Evangelos (2017) -
Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer
Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Gogolides, Evangelos (2018) -
Contact edge roughness and CD uniformity in EUV: effect of photo acid generator and sensitizer
Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2012) -
Contact edge roughness: effects of dose and PAG concentration in EUV lithography
Kuppuswamy, Vijaya Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2011) -
Contact-edge roughness (CER) characterization and modeling: effect of dose on CER and crtitical dimension uniformity
Kuppuswamy, Vijaya-Kumar Murugesan; Constantoudis, Vassilios; Gogolides, Evangelos; Gronheid, Roel; Vaglio Pret, Alessandro (2011) -
Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
Murugesan Kuppuswamy, Vijaya-Kumar; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2013) -
Deep learning nanometrology of line edge roughness
Giannatou, Eva; Constantoudis, Vassilios; Papavieros, George; Papageorgiou, Harris; Rutigliani, Vito; Lorusso, Gian; Van Roey, Frieda; Gogolides, Evangelos (2019) -
Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
Ercken, Monique; Leunissen, Peter; Pollentier, Ivan; Patsis, G.; Constantoudis, V.; Gogolides, Evangelos (2004) -
Multifractal analysis of line-edge roughness
Costantoudis, Vassilios; Papaverios, George; Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Gogolides, Evangelos (2018) -
Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization
Rutigliani, Vito; Lorusso, Gian; De Simone, Danilo; Lazzarino, Frederic; Rispens, Gijsbert; Papavieros, George; Gogolides, Evangelos; Costantoudis, Vassilios; Mack, Chris (2018) -
Towards a complete description of line width roughness: a comparison of different methods for vertical and spatial LER and LWR analysis
Constantoudis, Vassilis; Patsis, George; Leunissen, Peter; Gogolides, Evangelos (2004)