Browsing by author "Li, Li"
Now showing items 1-6 of 6
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Comparison of the stability of the surface structure and H-termination of the H2 annealed and HF-last cleaned (100) silicon
Bender, Hugo; Li, Li; Mertens, Paul; Caymax, Matty; Heyns, Marc (1994) -
Improvement and evaluation of drying techniques for HF-last wafer cleaning
Li, Li; Zou, Gang; Bender, Hugo; Mertens, Paul; Meuris, Marc; Schmidt, Harald; Heyns, Marc (1994) -
Improvement of high temperature water rinsing and drying for HF-last wafer cleaning
Li, Li; Bender, Hugo; Zou, Gang; Mertens, Paul; Meuris, Marc; Heyns, Marc (1996) -
New drying techology for advanced cleaning in IC manufacturing
Meuris, Marc; Mertens, Paul; Schmidt, Harald; Hurd, Trace; Li, Li; Heyns, Marc; Jonckx, Franky; Maex, Karen; Schild, R.; Locke, K.; Kozak, M. (1994) -
Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutions
Li, Li; Bender, Hugo; Trenkler, Thomas; Mertens, Paul; Meuris, Marc; Vandervorst, Wilfried; Heyns, Marc (1995) -
UV/ozone pre-treatment on organic contaminated wafer for complete oxide removal in HF vapour cleaning
Li, Li; Alay, Josep Lluis; Mertens, Paul; Meuris, Marc; Vandervorst, Wilfried; Heyns, Marc; De Blank, Rene; Schuivens, Eugene (1994)