Browsing by author "Ercken, Monique"
Now showing items 21-40 of 106
-
Complementary phase-shift mask towards 70-nm technology node
Driessen, Frank; Vandenberghe, Geert; Ercken, Monique; Montgomery, Patrick; Ronse, Kurt; Van Adrichem, Paul; Li, J.; Liu, H.Y.; Karklin, L. (2002) -
Current status of 193 nm immersion lithography and outlook to the future
Ronse, Kurt; Cheng, Shaunee; Ercken, Monique; Leunissen, Peter; Maenhoudt, Mireille; Vandenberghe, Geert; Van den hove, Luc (2005) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Determining the impact of statistical fluctuations on resist edge roughness
Leunissen, Peter; Ercken, Monique; Patsis, G.P. (2005) -
Determining the impact of statistical fluctuations on resist line edge roughness
Leunissen, Peter; Ercken, Monique; Patsis, George P. (2004) -
Double hard mask strategy for patterning 0.186 micron2 SRAM cells using FinFET technology
Demand, Marc; Veloso, Anabela; Brus, Stephan; Delvaux, Christie; De Backer, Johan; Ercken, Monique; Boullart, Werner (2008) -
Double patterning: from split to process control
Wiaux, Vincent; Ercken, Monique; Maenhoudt, Mireille; Cheng, Shaunee (2007) -
Doubling or quadrupling MuGFET Fin integration scheme with higher pattern fidelity, lower CD variation and higher layout efficiency
Rooyackers, Rita; Augendre, Emmanuel; Degroote, Bart; Collaert, Nadine; Nackaerts, Axel; Dixit, Abhisek; Vandeweyer, Tom; Pawlak, Bartek; Ercken, Monique; Kunnen, Eddy; Dilliway, Gabriela; Leys, Frederik; Loo, Roger; Jurczak, Gosia; Biesemans, Serge (2007) -
Dry-etch fin patterning of a sub-22nm node SRAM cell: EUV lithography new dry etch challenges
Altamirano Sanchez, Efrain; Yamaguchi, Yoko Yamaguchi; Lindain, Jeffrey Lindain; Horiguchi, Naoto; Ercken, Monique; Demand, Marc; Boullart, Werner (2011) -
Dry-etch Fin patterning on SOI: transition from 32 to 22nm node on a 6T-SRAM cell
Altamirano Sanchez, Efrain; Ercken, Monique; Veloso, Anabela; Demand, Marc; Boullart, Werner (2009) -
Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
Kim, Hyun-Woo; Delvaux, Christie; Baerts, Christina; Gronheid, Roel; Foubert, Philippe; Kishimura, Shinji; Ercken, Monique (2005) -
Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resists
Ercken, Monique; Leunissen, Peter; Pollentier, Ivan; Patsis, G.; Constantoudis, V.; Gogolides, Evangelos (2004) -
Exploring resist options for EUV layers of IMEC N5 CMOS vehicle
Thiam, Arame; Paolillo, Sara; Lazzarino, Frederic; Ercken, Monique; Wong, Patrick; Charley, Anne-Laure (2019) -
Fabrication of magnetic tunnel junctions connected through a continuous free layer to enable spin logic devices
Wan, Danny; Manfrini, Mauricio; Vaysset, Adrien; Souriau, Laurent; Wouters, Lennaert; Thiam, Arame; Raymenants, Eline; Sayan, Safak; Jussot, Julien; Swerts, Johan; Couet, Sebastien; Rassoul, Nouredine; Babaei Gavan, Khashayar; Paredis, Kristof; Huyghebaert, Cedric; Ercken, Monique; Wilson, Chris; Mocuta, Dan; Radu, Iuliana (2018) -
Fine lines between success and failure
Kinkead, D. A.; Ercken, Monique (2000) -
FinFETs and their futures
Horiguchi, Naoto; Parvais, Bertrand; Chiarella, Thomas; Collaert, Nadine; Veloso, Anabela; Rooyackers, Rita; Verheyen, Peter; Witters, Liesbeth; Redolfi, Augusto; De Keersgieter, An; Brus, Stephan; Zschaetzsch, Gerd; Ercken, Monique; Altamirano Sanchez, Efrain; Locorotondo, Sabrina; Demand, Marc; Jurczak, Gosia; Vandervorst, Wilfried; Hoffmann, Thomas Y.; Biesemans, Serge (2011) -
FinFETs and their futures
Horiguchi, Naoto; Parvais, Bertrand; Chiarella, Thomas; Collaert, Nadine; Veloso, Anabela; Rooyackers, Rita; Verheyen, Peter; Witters, Liesbeth; Redolfi, Augusto; De Keersgieter, An; Brus, Stephan; Zschaetzsch, Gerd; Ercken, Monique; Altamirano Sanchez, Efrain; Locorotondo, Sabrina; Demand, Marc; Jurczak, Gosia; Vandervorst, Wilfried; Hoffmann, Thomas Y.; Biesemans, Serge (2010) -
Front-end-of-line process development using 193-nm lithography
Pollentier, Ivan; Ercken, Monique; Eliat, Astrid; Delvaux, Christie; Jaenen, Patrick; Ronse, Kurt (2001) -
Full spectral analysis of line edge roughness
Leunissen, Peter; Lorusso, Gian; Ercken, Monique; Croon, Jeroen; Yang, H.; Azordegan, A.; DiBiase, Tony (2005) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008)