Browsing by author "Lux, Marcel"
Now showing items 21-40 of 79
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Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Lux, Marcel; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Mertens, Paul; Heyns, Marc; Vinckier, Chris (2002) -
Cost-effective cleaning for advanced Si-processing
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Knotter, D. M.; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Snee, Peter; Teerlinck, Ivo; Vos, Rita (1998) -
Deposition of trace metals to a wafer surface from lithography materials
Ramage, R. W.; Vos, Rita; Meuris, Marc; Lux, Marcel (1998) -
Development of advanced corrosion free organic strippers for ULSI processing
Rotondaro, Antonio; Honda, K.; Maw, T.; Perry, D.; Lux, Marcel; Heyns, Marc; Claeys, C.; Daraktchiev, I. (1996) -
Developments in cleaning technology for critical layers
Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000) -
Effect of chemical solutions and surface wettability on the stability of advanced porous low-k materials
Le, Quoc Toan; Vereecke, Guy; Bertha, Anne; Kesters, Els; Lux, Marcel; Struyf, Herbert (2011) -
Effect of plasma treatments on the compatibility of ULK to wet cleaning
Xu, Kaidong; Kesters, Els; Vereecke, Guy; Lux, Marcel; Kraus, H; Henry, S.A.; Archer, L; Gaulhofer, E.; Kovacs, F.; Dalmer, M; Schmidt, T; Leunissen, Peter; Mertens, Paul; Luo, S.J.; Han, Q. Y. (2007) -
Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnect
Le, Quoc Toan; Lux, Marcel; Kesters, Els; Prager, Lutz; Vereecke, Guy (2009) -
Effect of radical scavenger and UV irradiation on removal of photoresist and BARC using water/ozone in Cu/low-k interconnect
Le, Quoc Toan; Lux, Marcel; Kesters, Els; Vereecke, Guy (2009) -
Evaluation of megasonic cleaning for particle removal efficiency and damaging
Vereecke, Guy; Holsteyns, Frank; Xu, Kaidong; Lux, Marcel; Vos, Rita; Mertens, Paul; Loper, S.; Grothe, P. (2003) -
Evaluation of megasonic cleaning for sub-90-nm technologies
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
Evaluation of megasonic cleaning for sub-90-nm technologies
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Beckx, Stephan; Jaenen, Patrick; Kenis, Karine; Lismont, Mark; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2005) -
Evaluation of megasonic cleaning systems for particle removal efficiency and damaging
Vereecke, Guy; Holsteyns, Frank; Veltens, J.; Lux, Marcel; Arnauts, Sophia; Kenis, Karine; Vos, Rita; Mertens, Paul; Heyns, Marc (2003) -
Evaluation of megasonic cleaning systems for particle removal efficiency and damaging
Vereecke, Guy; Holsteyns, Frank; Veltens, Tom; Lux, Marcel; Arnauts, Sophia; Kenis, Karine; Vos, Rita; Mertens, Paul; Heyns, Marc (2004) -
Evaluation of ozonated water spray for resist cleaning applications
De Gendt, Stefan; Lux, Marcel; Claes, Martine; Jassal, A. S.; Van Hoeymissen, Jan; Lagrange, Sébastien; Bergman, E.; Mertens, Paul; Heyns, Marc (1999) -
Evaluation of ozonated water spray for resist cleaning applications
De Gendt, Stefan; Lux, Marcel; Claes, Martine; Van Hoeymissen, Jan; Conard, Thierry; Worth, W.; Lagrange, Sébastien; Bergman, E.; Jassal, A. S.; Mertens, Paul; Heyns, Marc (2000) -
Impact of trace metals in lithochemicals
Vos, Rita; Lux, Marcel; Meuris, Marc; Mertens, Paul; Heyns, Marc; Ramage, R. (1998) -
Impact of trace metals in lithochemicals
Vos, Rita; Lux, Marcel; Meuris, Marc; Mertens, Paul; Heyns, Marc; Ramage, R. (1999) -
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Tokei, Zsolt; Hendrickx, Dirk; Struyf, Herbert; Vandervorst, Alain; Claes, Martine; Lux, Marcel; Versluijs, Janko; Alaerts, Wilfried; Van Besien, Els; Deweerdt, Bruno; Vaes, Jan; Caluwaerts, Rudy; Cockburn, Andrew; Gravey, Virginie; Shah, Kavita; Al-Bayati, A.; Fu, X.; Lubben, D.; Sundarrajan, A.; Beyer, Gerald (2008) -
Implementation of the IMEC-Clean in advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (1999)