Browsing by author "Conard, Thierry"
Now showing items 21-40 of 597
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Achieving reproducible data: examples from surface analysis in semiconductor technology
Conard, Thierry; van der Heide, Paul; Vanleenhove, Anja; Zborowski, Charlotte; Vandervorst, Wilfried (2019) -
Adhesion study between materials for integration of copper and inorganic low-k dielectrics
Lanckmans, Filip; Brongersma, Sywert; Poortmans, Jef; Conard, Thierry; Bender, Hugo; Beyne, Eric; Maex, Karen (2001) -
Advanced a-VMCO resistive switching memory through inner interface engineering with wide (>10²) on/off window, tunable μA-range switching current and excellent variability
Govoreanu, Bogdan; Di Piazza, Luca; Ma, Jigang; Conard, Thierry; Vanleenhove, Anja; Belmonte, Attilio; Radisic, Dunja; Popovici, Mihaela Ioana; Velea, Alin; Redolfi, Augusto; Richard, Olivier; Clima, Sergiu; Adelmann, Christoph; Bender, Hugo; Jurczak, Gosia (2016) -
Advanced material characterization by TOFSIMS in microelectronics
Conard, Thierry; Vandervorst, Wilfried (2005) -
Advanced metrologies for cleans characterization: ARXPS, GIXF and NEXAFS
Conard, Thierry; List, Scott; Claes, Martine; Beckhoff, Buckard (2008) -
Advanced surface preparation leading into the nano-era
Onsia, Bart; De Gendt, Stefan; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Conard, Thierry; Heyns, Marc; Lin, S.; Green, Martin; Tsai, Wilman (2003) -
Advances in metrology for complex epitaxial systems embedded in small volums
Vandervorst, Wilfried; Kumar, Arul; Meersschaut, Johan; Franquet, Alexis; Douhard, Bastien; Delmotte, Joris; Conard, Thierry; Nuytten, Thomas; Hantschel, Thomas; Loo, Roger (2015-05) -
Al2O3/InGaAs metal-oxide-semiconductor interface properties: impact of Gd2O3 and Sc2O3 interfacial layers by atomic layer deposition
Ameen, Mahmoud; Nyns, Laura; Sioncke, Sonja; Lin, Dennis; Ivanov, Tsvetan; Conard, Thierry; Meersschaut, Johan; Feteha, M. Y.; Van Elshocht, Sven; Delabie, Annelies (2014) -
ALCVD hafnium silicates for low power gate stacks
Maes, Jan; Laitinen, O.; De Witte, Hilde; Deweerd, Wim; Delabie, Annelies; Conard, Thierry; Brijs, Bert; Wang, C. - G.; Velasco, H.; Wilk, G. (2004) -
ALD HfO2 surface preparation study
Delabie, Annelies; Caymax, Matty; Maes, Jan; Bajolet, Philippe; Brijs, Bert; Cartier, Eduard; Conard, Thierry; De Gendt, Stefan; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Green, Martin; Tsai, Wilman; Heyns, Marc (2003) -
ALD High-k growth on Ge substrates
Delabie, Annelies; Brijs, Bert; Caymax, Matty; Chiarella, Thomas; Conard, Thierry; Puurunen, Riikka; Richard, Olivier; Van Steenbergen, Jan; Teerlinck, Ivo; Zhao, Chao; Heyns, Marc; Meuris, Marc (2003) -
ALD on high mobility channels: engineering the proper gate stack passivation
Sioncke, Sonja; Lin, Hang Chun; Adelmann, Christoph; Brammertz, Guy; Delabie, Annelies; Conard, Thierry; Franquet, Alexis; Caymax, Matty; Meuris, Marc; Struyf, Herbert; De Gendt, Stefan; Heyns, Marc; Fleischmann, Claudia; Temst, K.; Vantomme, Andre; Muller, Matthias; Kolbe, Michael; Beckhoff, Burkhard; Schmeisser, Dieter; Tallarida, Massimo (2010) -
ALD on high mobility channels: engineering the proper gate stack passivation
Sioncke, Sonja; Lin, Dennis; Brammertz, Guy; Delabie, Annelies; Conard, Thierry; Caymax, Matty; Meuris, Marc; Struyf, Herbert; De Gendt, Stefan; Heyns, Marc; Fleischmann, Claudia; Temst, Kristiaan; Vantomme, Andre; Beckhoff, Burkhard (2010) -
ALD strontium titanates and their characterization
Popovici, Mihaela Ioana; Van Elshocht, Sven; Tomida, Kazuyuki; Menou, Nicolas; Swerts, Johan; Pawlak, Malgorzata; Kaczer, Ben; Kim, Min-Soo; Brijs, Bert; Favia, Paola; Conard, Thierry; Franquet, Alexis; Moussa, Alain; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Alternative high-k dielectrics for semiconductor applications
Van Elshocht, Sven; Adelmann, Christoph; Clima, Sergiu; Pourtois, Geoffrey; Conard, Thierry; Delabie, Annelies; Franquet, Alexis; Lehnen, Peer; Meersschaut, Johan; Menou, Nicolas; Popovici, Mihaela Ioana; Richard, Olivier; Schram, Tom; Wang, Xin Peng; Hardy, An; Dewulf, Daan; van Bael, M.K.; Blomberg, T.; Pieereux, D.; Swerts, J.; Maes, J.W.; Wouters, Dirk; De Gendt, Stefan; Kittl, Jorge (2008) -
Alternative high-k dielectrics for semiconductor applications
Van Elshocht, Sven; Adelmann, Christoph; Clima, Sergiu; Pourtois, Geoffrey; Conard, Thierry; Delabie, Annelies; Franquet, Alexis; Lehnen, Peer; Meersschaut, Johan; Menou, Nicolas; Popovici, Mihaela Ioana; Richard, Olivier; Schram, Tom; Wang, Xin Peng; Hardy, An; Dewulf, Daan; Van Bael, Marlies; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Maes, Jan; Wouters, Dirk; De Gendt, Stefan; Kittl, Jorge (2009) -
An alternative application of ToF-SIMS/in-situ AFM: controlled sample preparation for IC failure analysis
Franquet, Alexis; Spampinato, Valentina; Khaled, Ahmad; Conard, Thierry; Brand, Sebastian; Kogel, M; Wiesler, I; De Wolf, Ingrid (2019) -
Analyses of post metal etch cleaning in downstream H2O-based plasma followed by a wet chemistry
Li, H.; Baklanov, Mikhaïl; Boullart, Werner; Conard, Thierry; Brijs, Bert; Maex, Karen; Froyen, L. (1999) -
Analytical characterization of new high k dielectric stacks
De Witte, Hilde; Conard, Thierry; Bender, Hugo; Vandervorst, Wilfried (2000)