Browsing by author "Thiam, Arame"
Now showing items 21-31 of 31
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Plasma etch challenges and processing optimization in spin logic device fabrication
Canvel, Yann; Souriau, Laurent; Wan, Danny; Trovato, Anna; Thiam, Arame; Tsvetanova, Diana; Carpenter, Robert; Raymenants, Eline; Asselberghs, Inge; Lazzarino, Frederic; Couet, Sebastien; Kar, Gouri Sankar; Nguyen, Van Dai (2022-11-08) -
Recent advances in EUV patterning in preparation towards high-NA EUV
Nagahara, Seiji; Dauendorffer, Arnaud; Thiam, Arame; Liu, Xiang; Kuwahara, Yuhei; Dinh, Cong Que; Okada, Soichiro; Kawakami, Shinichiro; Genjima, Hisashi; Nagamine, Noriaki; Muramatsu, Makoto; Shimura, Satoru; Tsuboi, Atsushi; Nafus, Kathleen; Feurprier, Yannick; Demand, Marc; Ramaneti, Rajesh; Foubert, Philippe; De Simone, Danilo; Vandenberghe, Geert (2023) -
Scaled spintronic logic device based on domain wall motion in magnetically interconnected tunnel junctions
Raymenants, Eline; Wan, Danny; Couet, Sebastien; Zografos, Odysseas; Nguyen, Van Dai; Vaysset, Adrien; Souriau, Laurent; Thiam, Arame; Manfrini, Mauricio; Brus, Stephan; Heyns, Marc; Mocuta, Dan; Nikonov, Dmitry; Manipatruni, S.; Young, Ian; Devolder, Thibaut; Radu, Iuliana (2018) -
Scaled transistors with 2D materials from the 300mm fab
Asselberghs, Inge; Schram, Tom; Smets, Quentin; Groven, Benjamin; Brems, Steven; Phommahaxay, Alain; Cott, Daire; Dupuy, Emmanuel; Radisic, Dunja; de Marneffe, Jean-Francois; Thiam, Arame; Li, Waikin; Devriendt, Katia; Gaur, Abhinav; Verreck, Devin; Maurice, Thibaut; Lin, Dennis; Morin, Pierre; Radu, Iuliana (2020) -
Scaling of double-gated WS2 FETs to sub-5nm physical gate length fabricated in a 300mm FAB
Smets, Quentin; Schram, Tom; Verreck, Devin; Cott, Daire; Groven, Benjamin; Ahmed, Zubair; Kaczer, Ben; Mitard, Jerome; Wu, Xiangyu; Kundu, Souvik; Mertens, Hans; Radisic, Dunja; Thiam, Arame; Li, Waikin; Dupuy, Emmanuel; Tao, Zheng; Vandersmissen, Kevin; Maurice, Thibaut; Lin, Dennis; Morin, Pierre; Asselberghs, Inge; Radu, Iuliana (2021) -
Semi-damascene Integration of a 2-layer MOL VHV Scaling Booster to Enable 4-track Standard Cells
Vega Gonzalez, Victor; Radisic, Dunja; Choudhury, Subhobroto; Tierno, Davide; Thiam, Arame; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Seidel, Felix; Decoster, Stefan; Kundu, Souvik; Tsvetanova, Diana; Peter, Antony; De Coster, Hanne; Sepulveda Marquez, Alfonso; Altamirano Sanchez, Efrain; Chan, BT; Drissi, Youssef; Sherazi, Yasser; Lee, Jae Uk; Ciofi, Ivan; Murdoch, Gayle; Nagesh, Nishanth; Hellings, Geert; Ryckaert, Julien; Biesemans, Serge; Dentoni Litta, Eugenio; Horiguchi, Naoto; Park, Seongho; Tokei, Zsolt (2022) -
Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
Santaclara, Jara G; Rispens, Gijsbert; Bekaert, Joost; Thiam, Arame; Maslow, Mark; Hoefnagels, Rik; Zuurbier, Nadia; van Lent, Lidia; Fong Choi, Yin (2021) -
Tone reversal patterning for advanced technology nodes
Schleicher, Filip; Bekaert, Joost; Thiam, Arame; Decoster, Stefan; Blanc, Romuald; Lazzarino, Frederic; Santaclara, J. Garcia; Rispens, G.; Maslow, M. (2022) -
Towards high NA patterning readiness: Materials, processes and etch transfer for P24 Line Space
Santaclara, J. G.; Maslow, M. J.; Thiam, Arame; Franke, Joern-Holger; Schleicher, Filip; Blanc, Romuald; Bezard, Philippe; Moussa, Alain; Hendrickx, Eric; Wong, Patrick (2021) -
Wafer-scale integration of double gated WS2-transistors in 300mm Si CMOS fab
Asselberghs, Inge; Smets, Quentin; Schram, Tom; Groven, Benjamin; Verreck, Devin; Afzalian, Aryan; Arutchelvan, Goutham; Gaur, Abhinav; Cott, Daire; Maurice, Thibaut; Brems, Steven; Kennes, Koen; Phommahaxay, Alain; Dupuy, Emmanuel; Radisic, Dunja; de Marneffe, Jean-Francois; Thiam, Arame; Li, Waikin; Devriendt, Katia; Huyghebaert, Cedric; Lin, Dennis; Caymax, Matty; Morin, Pierre; Radu, Iuliana (2020) -
WS2 transistors on 300 mm wafers with BEOL compatibility
Schram, Tom; Smets, Quentin; Groven, Benjamin; Heyne, Markus; Kunnen, Eddy; Thiam, Arame; Devriendt, Katia; Delabie, Annelies; Lin, Dennis; Lux, Marcel; Chiappe, Daniele; Asselberghs, Inge; Brus, Stephan; Huyghebaert, Cedric; Sayan, Safak; Juncker, Aurélie; Caymax, Matty; Radu, Iuliana (2017)