Plasma etch challenges and processing optimization in spin logic device fabrication

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Authors
Canvel, Yann; Souriau, Laurent; Wan, Danny; Trovato, Anna; Thiam, Arame; Tsvetanova, Diana; Carpenter, Robert; Raymenants, Eline; Asselberghs, Inge; Lazzarino, Frederic; Couet, Sebastien; Kar, Gouri Sankar; Nguyen, Van Dai
Conference
AVS 68th International Symposium and Exhibition
Title
Plasma etch challenges and processing optimization in spin logic device fabrication
Publication type
Oral presentation
Embargo date
9999-12-31
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220.500.12860/40734.2*2024-04-09T07:56:19Zvalidation by library/open access desk
120.500.12860/407342022-11-14T09:21:54Z

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