Browsing by author "Heyns, Marc"
Now showing items 41-60 of 1135
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Adsorption of molecular oxygen on the reconstructed beta2(2x4)-GaAs(001) surface: a first-principles study
Scarrozza, Marco; Pourtois, Geoffrey; Houssa, Michel; Caymax, Matty; Meuris, Marc; Heyns, Marc; Stesmans, Andre (2009) -
Advanced characterisation : an indispensable tool for ultra clean processing
Vandervorst, Wilfried; Bender, Hugo; Storm, Wolfgang; Heyns, Marc; Polleunis, C.; Bertrand, P. (1995) -
Advanced cleaning and ultra-thin oxide technology
Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Advanced cleaning for the growth of ultrathin gate oxide
Mertens, Paul; Bearda, Twan; Houssa, Michel; Loewenstein, Lee; Cornelissen, Ingrid; De Gendt, Stefan; Kenis, Karine; Teerlinck, Ivo; Vos, Rita; Meuris, Marc; Heyns, Marc (1999) -
Advanced cleaning strategies for ultra-clean silicon surfaces
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, Sofie; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Advanced electrical characterization toward (sub) 1nm EOT HfSiON – hole trapping in PFET and L-dependent effects
Zahid, Mohammed; Pantisano, Luigi; Degraeve, Robin; Aoulaiche, Marc; Trojman, Lionel; Ferain, Isabelle; San Andres Serrano, Enrique; Groeseneken, Guido; Zhang, J.F.; Heyns, Marc; Jurczak, Gosia; De Gendt, Stefan (2007) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B. O.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2001) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2002) -
Advanced surface preparation leading into the nano-era
Onsia, Bart; De Gendt, Stefan; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Conard, Thierry; Heyns, Marc; Lin, S.; Green, Martin; Tsai, Wilman (2003) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Advanced wet and dry cleaning coming together for next generation
Heyns, Marc; Mertens, Paul; Ruzyllo, Jerzy; Leeman, Marc (1999) -
Advances in understanding wet cleaning technology and the effect of metal contamination
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Advancing CMOS beyond the Si roadmap with Ge and III/V devices
Heyns, Marc; Brammertz, Guy; Caymax, Matty; Groeseneken, Guido; Hoffmann, Thomas Y.; Lin, Dennis; Merckling, Clement; Meuris, Marc; Mitard, Jerome; Pourtois, Geoffrey; Verhulst, Anne; Wang, Gang (2010) -
Advancing CMOS beyond the Si roadmap: chronicle of a (r)evolution foretold
Heyns, Marc (2012) -
ALD applications in advanced CMOS scaling
Heyns, Marc (2014) -
ALD deposition of high-k and metal gate stacks for advanced CMOS applications
Heyns, Marc; Beckx, Stephan; Caymax, Matty; Claes, Martine; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Hooker, Jacob; Houssa, Michel; Kwak, Dong Hwa; Lander, Rob; Lujan, Guilherme; Maes, Jan; Niwa, Masaaki; Pantisano, Luigi; Puurunen, R.; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Van Elshocht, Sven; Vandervorst, Wilfried (2004) -
ALD for highly scaled CMOS and beyond
Heyns, Marc (2008) -
ALD HfO2 surface preparation study
Delabie, Annelies; Caymax, Matty; Maes, Jan; Bajolet, Philippe; Brijs, Bert; Cartier, Eduard; Conard, Thierry; De Gendt, Stefan; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Green, Martin; Tsai, Wilman; Heyns, Marc (2003) -
ALD High-k growth on Ge substrates
Delabie, Annelies; Brijs, Bert; Caymax, Matty; Chiarella, Thomas; Conard, Thierry; Puurunen, Riikka; Richard, Olivier; Van Steenbergen, Jan; Teerlinck, Ivo; Zhao, Chao; Heyns, Marc; Meuris, Marc (2003) -
ALD of Al2O3 for carbon nanotube vertical interconnect and its impact on the electrical properties
Chiodarelli, Nicolo; Delabie, Annelies; Masahito, Sugiura; Kashiwagi, Yusaku; Richard, Olivier; Bender, Hugo; Cott, Daire; Heyns, Marc; De Gendt, Stefan; Groeseneken, Guido; Vereecken, Philippe (2011)