Browsing by author "Leray, Philippe"
Now showing items 41-60 of 115
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Gate isolation technology for compact poly-CMP embedded flash memories
Slotboom, Michiel; Goarin, Pierre; Akil, Nader; Van Duuren, Michiel; Demand, Marc; Wouters, Johan M. D.; Beckx, Stephan; Leray, Philippe; Baerts, Christina; Heylen, Nancy; Pollentier, Ivan (2003) -
High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification
Cross, Andrew; Sah, Kaushik; Anantha, Vidyasagar; Gupta, Balarka; Ynzunza, Ramon; Troy, Neil; Wu, Kenong; Babulnath, Raghav; Rajendran, Meghna; Van den Heuvel, Dieter; Leray, Philippe (2020) -
High speed optical metrology solution for after etch process monitoring and control
Charley, Anne-Laure; Leray, Philippe; Pypen, Wouter; Cheng, Shaunee; Verma, Alok; Mattheus, Christine; Wisse, Baukje; Cramer, Hugo; Niesing, Henk; Kruijswijk, Stefan (2014) -
High-speed full 3D feature metrology for litho monitoring, matching and model calibration with scatterometry
Cramer, H.; Chen, An; Li, Frank; Leray, Philippe; Charley, Anne-Laure; Van Look, Lieve; Bekaert, Joost; Cheng, Shaunee (2012) -
High-throughput multi-beam SEM: quantitative analysis of imaging capabilities at imec-N10 logic node
Neumann, J.T.; Garbowski, T.; Högele, W.; Korb, T.; Halder, Sandip; Leray, Philippe; Garreis, R.; le Maire, M.; Zeidler, D. (2017) -
Hybrid overlay metrology for high order correction by using CDSEM
Leray, Philippe; Halder, Sandip; Lorusso, Gian; Baudemprez, Bart; Inoue, Osamu; Okagawa, Yutaka (2016) -
Hybrid overlay metrology with CDSEM in a BEOL patterning scheme
Leray, Philippe; Jehoul, Christiane; Inoue, Osamu; Okagawa, Yutaka (2015) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Imaging of buried overlay and alignment markers using picosecond acoustic microscopy
Mehendale, Manjusha; Antonelli, Andy; Mair, Robin; Mukundhan, Priya; Bogdanowicz, Janusz; Blanco, Victor; Charley, Anne-Laure; Leray, Philippe (2022) -
IMAGING OF OVERLAY AND ALIGNMENT MARKERS UNDER OPAQUE LAYERS USING PICOSECOND LASER ACOUSTIC MEASUREMENTS AM: Advanced Metrology
Mehendale, M.; Antonelli, A.; Mair, R.; Mukundhan, P.; Bogdanowicz, Janusz; Charley, Anne-Laure; Leray, Philippe; Yasin, Farrukh; Crotti, Davide (2021) -
Imaging semiconductor patterns at N10 logic node with a high-throughput multi-beam SEM
Neumann, J.T.; Garaboski, T.; Halder, Sandip; Leray, Philippe; Garreis, R.; Zeidler, D. (2016) -
Immersion photoresist qualification
Ercken, Monique; Gronheid, Roel; Pollentier, Ivan; Leray, Philippe (2007-05) -
In field overlay uncertainty contributors
Frommer, Aviv; Kassel, Elyakim; Izikson, Pavel; Adel, Mike; Leray, Philippe; Shultz, Bernd (2005) -
In-chip overlay metrology in 90 nm production
Schultz, Bernd; Seltmann, Rolf; Paufler, Joerg; Leray, Philippe; Kassel, Elyakim; Adel, Mike; Izikson, Pavel; Frommer, Aviv (2005) -
Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning
Hasan, Mahmudul; Beral, Christophe; Lorusso, Gian; De Simone, Danilo; Moussa, Alain; Van den Heuvel, Dieter; Charley, Anne-Laure; Leray, Philippe (2022) -
Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Gunay Demirkol, Anil; Altamirano Sanchez, Efrain; Héraud, Stéphane; Godny, Stephane; Charley, Anne-Laure; Leray, Philippe; Urenski, Ronen; Cohen, Oded; Turovets, Igor; Wolfling, Shay (2016) -
Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms
Halder, Sandip; Truffert, Vincent; Van Den Heuvel, Dieter; Leray, Philippe; Cheng, Shaunee; McIntyre, Greg; Sah, Kaushik; Brown, Jim; Parisi, Paolo; Polli, Marco (2015) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
Sarkar, Sujan Kumar; Das, Sayantan; Blanco, Victor; Leray, Philippe; Halder, Sandip (2022) -
Knowledge-based APC methodology for overlay control
Laidler, David; Leray, Philippe; Crow, D.A.; Roberts, K.E. (2003)