Recently added

Wet selective SiGe etch to enable Ge nanowire formation.

Sebaai, Farid; Witters, Liesbeth; Holsteyns, Frank; Wostyn, Kurt; Rip, Jens; Yukifumi, Yoshida; Lieten, Ruben; Bilodeau, Steven; Cooper, Emanuel (2016)

Seeing the invisible: metrology for extended crystalline defects in beyond silicon semiconductors

Schulze, Andreas; Prokhodtseva, Anna; Vystavel, Tomas; Gachet, David; Berney, Jean; Loo, Roger; Vandervorst, Wilfried; Caymax, Matty (2016)

Outwitting the series resistance in scanning spreading resistance microscopy

Schulze, Andreas; Cao, Ruping; Eyben, Pierre; Hantschel, Thomas; Vandervorst, Wilfried (2016)

Comparison of spatial and aspatial logistic regression models for landmine risk mapping

Schultz, Craig; Alegría, Aura; Cornelis, Jan; Sahli, Hichem (2016)

Evaluation of optical material parameters for advanced absorbers on EUV masks

Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; van de Kruijs, Robbert (2016)

Characterization of optical material properties for alternative EUV mask absorber materials

Scholze, Frank; Laubis, Christian; Philipsen, Vicky; Luong, Vu; Edrisi, Arash; Van de Kruijs, Robbert (2016)

Impact of wafer thinning on ESD protection devices in 3D integrated systems

Scholz, Mirko; Vaisman Chasin, Adrian; Linten, Dimitri; Van der Plas, Geert; Beyne, Eric (2016-05)

ESD protection design in a-IGZO TFT technologies

Scholz, Mirko; Steudel, Soeren; Myny, Kris; Chen, Shih-Hung; Boschke, Roman; Hellings, Geert; Linten, Dimitri (2016-09)

Impact of on- and off-chip protection on the transient-induced latch-up sensitivity of CMOS IC

Scholz, Mirko; Chen, Shih-Hung; Hellings, Geert; Linten, Dimitri; Groeseneken, Guido (2016-02)

HMM single site testing: Can we reproduce component failure level with the HMM document?

Scholz, Mirko; Ashton, Robert; Smedes, Theo; Derikx, Richard; Dekker, Marcel; Barth, Jon (2016-09)

Using digital masks to enhance the bandwidth tolerance and improve the performance of on-chip reservoir computing systems

Schneider, Bendix; Dambre, Joni; Bienstman, Peter (2016-12)

Fast particle characterization using digital holography and neural networks

Schneider, Bendix; Dambre, Joni; Bienstman, Peter (2016-01)

Surface analysis of the selective excimer laser patterning of a thin PEDOT:PSS film on flexible polymer films

Schaubroeck, David; De Smet, Jelle; Willems, Wouter; Cools, Pieter; De Geyter, Nathalie; Morent, Rino; De Smet, Herbert; Van Steenberge, Geert (2016)

PLAT4M: processing silicon photonics in europe

Scarcella, C.; Lee, Jun Su; Eason, C.; Antier, M.; Bourderionnet, Jerome; Larat, C.; Lallier, E.; Brignon, Arnoud; Spuesens, Thijs; Verheyen, Peter; Absil, Philippe; Baets, Roel; O'Brien, Peter (2016-12)

EUV extendibility via dry development rinse process

Sayan, Safak; Tao, Zheng; De Simone, Danilo; Vandenberghe, Geert (2016)

Toward sub-20nm pitch Fin patterning and integration with DSA

Sayan, Safak; Marzook, Taisir; Chan, BT; Vandenbroeck, Nadia; Singh, Arjun; Laidler, David; Altamirano Sanchez, Efrain; Leray, Philippe; Rincon Delgadillo, Paulina; Gronheid, Roel; Vandenberghe, Geert; Clark, William; Juncker, Aurelie (2016)

Dielectric properties of spin-on metal oxides and their applications for 2D semiconductor devices

Sayan, Safak; Lin, Dennis; Asselberghs, Inge; Chiappe, Daniele; Sutar, Surajit; Radu, Iuliana; Thean, Aaron; Petermann, Claire; Hong, Sung Eun (2016)

Imaging of photonic crystal cavity mode via refractive index sensing

Saurav, Kumar; Thomas, N. Le (2016)

Mapping nano-object induced pertubations of photonic crystal cavity modes

Saurav, Kumar; Le Thomas, Nicolas (2016)

Fabrication of substrate-less planar silicon photonic crystal cavities

Saurav, Kumar; Le Thomas, Nicolas (2016)

imec Publications: Recent submissions

Wet selective SiGe etch to enable Ge nanowire formation. ﻿

Seeing the invisible: metrology for extended crystalline defects in beyond silicon semiconductors ﻿

Outwitting the series resistance in scanning spreading resistance microscopy ﻿

Comparison of spatial and aspatial logistic regression models for landmine risk mapping ﻿

Evaluation of optical material parameters for advanced absorbers on EUV masks ﻿

Characterization of optical material properties for alternative EUV mask absorber materials ﻿

Impact of wafer thinning on ESD protection devices in 3D integrated systems ﻿

ESD protection design in a-IGZO TFT technologies ﻿

Impact of on- and off-chip protection on the transient-induced latch-up sensitivity of CMOS IC ﻿

HMM single site testing: Can we reproduce component failure level with the HMM document? ﻿

Using digital masks to enhance the bandwidth tolerance and improve the performance of on-chip reservoir computing systems ﻿

Fast particle characterization using digital holography and neural networks ﻿

Surface analysis of the selective excimer laser patterning of a thin PEDOT:PSS film on flexible polymer films ﻿

PLAT4M: processing silicon photonics in europe ﻿

EUV extendibility via dry development rinse process ﻿

Toward sub-20nm pitch Fin patterning and integration with DSA ﻿

Dielectric properties of spin-on metal oxides and their applications for 2D semiconductor devices ﻿

Imaging of photonic crystal cavity mode via refractive index sensing ﻿

Mapping nano-object induced pertubations of photonic crystal cavity modes ﻿

Fabrication of substrate-less planar silicon photonic crystal cavities ﻿