Browsing Conference contributions by imec author "932bfdb912d15c917ceff30f781d334147613cc1"
Now showing items 1-20 of 27
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3D features measurement using YieldStar, an angle resolved polarized scatterometer
Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, Paul; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011) -
3D features measurement using Yieldstar, an angle resolved polarized scatterometer
Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, P.; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011) -
A single metrology tool solution for complete exposure tool setup
Laidler, David; D'have, Koen; Charley, Anne-Laure; Leray, Philippe; Cheng, Shaunee; Dusa, Mircea; Vanoppen, Peter; Hinnen, Paul (2010) -
A Study of SiCN Wafer-to-Wafer Bonding and Impact of Wafer Warpage
Iacovo, Serena; D'have, Koen; Okudur, Oguzhan Orkut; De Vos, Joeri; Uhrmann, Thomas; Plach, Thomas; Conard, Thierry; Meersschaut, Johan; Bex, Pieter; Brems, Steven; Phommahaxay, Alain; Gonzalez, Mario; Witters, Liesbeth; Beyer, Gerald; Beyne, Eric (2023) -
Cluster optimization to improve total CD control as an enabler for double patterning
Laidler, David; D'have, Koen; Rosslee, Craig; Tedeschi, Len (2008) -
Cluster optimization to improve total CD control as an enabler for double patterning
Tedeschi, Len; Rosslee, C.; Laidler, David; Leray, Philippe; D'have, Koen (2008) -
Comparison of back side chrome focus monitor to focus self-metrology of an immersion scanner
D'have, Koen; Machida, Takahiro; Laidler, David; Cheng, Shaunee (2007) -
Detection of split design-related weak points in double patterning using PQW and bright-field defect inspection
Van Den Heuvel, Dieter; Cheng, Shaunee; Leray, Philippe; Wiaux, Vincent; Maenhoudt, Mireille; D'have, Koen; Jaenen, Patrick; Marcuccilli, Gino; Malik, Irfan; Klein, Sophie (2008) -
Diffraction based overlay re-assessed
Leray, Philippe; Laidler, David; D'have, Koen; Cheng, Shaunee (2011) -
Enabling Logic with Backside Connectivity via n-TSVs and its Potential as a Scaling Booster
Veloso, Anabela; Jourdain, Anne; Hiblot, Gaspard; Schleicher, Filip; D'have, Koen; Sebaai, Farid; Radisic, Dunja; Loo, Roger; Hopf, Toby; De Keersgieter, An; Arimura, Hiroaki; Eneman, Geert; Favia, Paola; Geypen, Jef; Arutchelvan, Goutham; Vaisman Chasin, Adrian; Jang, Doyoung; Nyns, Laura; Rosseel, Erik; Hikavyy, Andriy; Mannaert, Geert; Chan, BT; Devriendt, Katia; Demuynck, Steven; Van der Plas, Geert; Ryckaert, Julien; Beyer, Gerald; Dentoni Litta, Eugenio; Beyne, Eric; Horiguchi, Naoto (2021) -
Focus and dose de-convolution technique for improved CD-control of immersion clusters
Charley, Anne-Laure; D'have, Koen; Leray, Philippe; Laidler, David; Cheng, Shaunee; Dusa, Mircea; Hinnen, Paul; Vanoppen, Peter (2010) -
Forksheet FETs for Advanced CMOS Scaling: Forksheet-Nanosheet Co-Integration and Dual Work Function Metal Gates at 17nm N-P Space
Mertens, Hans; Ritzenthaler, Romain; Oniki, Yusuke; Briggs, Basoene; Chan, BT; Hikavyy, Andriy; Hopf, Toby; Mannaert, Geert; Tao, Zheng; Sebaai, Farid; Peter, Antony; Vandersmissen, Kevin; Dupuy, Emmanuel; Rosseel, Erik; Batuk, Dmitry; Geypen, Jef; Martinez Alanis, Gerardo Tadeo; Abigail, Daniel_; Grieten, Eva; D'have, Koen; Mitard, Jerome; Subramanian, Sujith; Ragnarsson, Lars-Ake; Weckx, Pieter; Chehab, Bilal; Hellings, Geert; Ryckaert, Julien; Dentoni Litta, Eugenio; Horiguchi, Naoto (2021) -
Immersion specific error contributions to overlay control
D'have, Koen; Laidler, David; Cheng, Shaunee (2008) -
Intra-field mask-to-mask overlay, separating the mask writing from the dynamic pellicle contribution
van Haren, Richard; Steinert, Steffen; Mouraille, Orion; D'have, Koen; van Dijk, Leon; Otten, Ronald; Beyer, Dirk (2018) -
Lithography imaging control by enhanced monitoring of light source performance
Alagna, Paolo; Zurita, Omar; Lalovic, Ivan; Seong, Nakgeuon; Rechsteiner, Gregory; Thornes, Joshua; D'have, Koen; Van Look, Lieve; Bekaert, Joost (2013) -
Mix and match overlay optimization for advanced lithography tools (193i and EUV)
Laidler, David; D'have, Koen; Hermans, Jan; Cheng, Shaunee (2012) -
Modeling for field-to-field overlay control
D'have, Koen; Cheng, Shaunee (2012) -
Novel monitoring of EUV litho cluster for manufacturing insertion
Truffert, Vincent; Ausschnitt, Kit; Nair, Vineet Vijayakrishnan; D'have, Koen (2020) -
Off-line mask-to-mask registration characterization
van Haren, Richard; Steinert, Steffen; Roelofs, Christian; Mouraille, Orion; D'have, Koen; van Dijk, Leon; Beyer, Dirk (2017) -
Optical proximity stability control of ArF immersion clusters
Van Look, Lieve; Bekaert, Joost; D'have, Koen; Laenens, Bart; Vandenberghe, Geert; Cheng, Shaunee; Schreel, Koen; Gemmink, Jan-Willem (2011)