Recently added

EUV lithography and the materials that propel it forward

Gallagher, Emily; Hendrickx, Eric; Kim, Ryan Ryoung han; Leray, Philippe; Philipsen, Vicky; Pollentier, Ivan; Rincon Delgadillo, Paulina; Ronse, Kurt; Timmermans, Marina; De Simone, Danilo (2020)

Analysis and comparison of algorithms for the tomographic reconstruction of curved fibers

Fröhler, B.; Elberfeld, Tim; Möller, T.; Hege, H.C; De Beenhouwer, Jan; Sijbers, Jan; Kastner, J.; Heinzl, C. (2020)

An adaptive probability map for the Discrete Algebraic Reconstruction Technique

Frenkel, Daniel; De Beenhouwer, Jan; Sijbers, Jan (2020)

Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes

Franke, Joern-Holger; Bekaert, Joost; Wiaux, Vincent; Nair, Vineet Vijayakrishnan; Hendrickx, Eric; Davydova, Natalia; van Dijk, Andre; Wang, Erik; Maslow, Mark (2020)

Enhancing the quality of low temperature SiO2 by atomic hydrogen exposure for excellent NBTI reliability

Franco, Jacopo; de Marneffe, Jean-Francois; Vandooren, Anne; Kimura, Yosuke; Nyns, Laura; Wu, Zhicheng; El-Sayed, Al-Moatasem; Jech, Markus; Waldhoer, Dominic; Claes, Dieter; Arimura, Hiroaki; Ragnarsson, Lars-Ake; Afanas'ev, Valeri; Stesmans, Andre; Horiguchi, Naoto; Linten, Dimitri; Grasser, Tibor; Kaczer, Ben (2020)

Probing complexities of 3D-stacked ICs – A test engineers' perspective

Fodor, Ferenc; De Wachter, Bart; Podpod, Arnita; Stucchi, Michele; Marinissen, Erik Jan (2020-11)

A strong pockels PZT/Si modulator for efficient electro-optic tuning

Fetumba, Gilles Freddy; Van de Veire, Tessa; Ansari, Irfan; George, John P.; Van Thourhout, Dries; Beeckman, Jeroen (2020)

Artificial Neural Network Regressor for Parametric Solder Strain Models for BGAs

Ferrando Villalba, Pablo; Nawghane, Chinmay; Vandevelde, Bart (2020)

BGA solder strain prediction using an Artificial Neural Network regressor

Ferrando Villalba, Pablo; Vandevelde, Bart (2020)

From passive to active human agency in artificial intelligence mediation

Fanni, R.; Steinkogler, V.; Zampedri, G.; Pierson, Jos (2020)

Contextualisation of data flow diagrams for security analysis

Faily, Shamal; Scandariato, Riccardo; Sion, Laurens; Ki-Aries, Duncan (2020)

Towards the generalization of distributed software communication

Eyckerman, Reinout; Huybrechts, Thomas; Van Den Langenbergh, Raf; Casteels, Wim; Mercelis, Siegfried; Hellinckx, Peter (2020)

Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography

Erdmann, Andreas; Mesilhy, Hazem; Evanschitsky, Peter; Philipsen, Vicky; Timmermans, Frank; Bauer, Markus (2020)

Stress simulations of fins, wires and nanosheets

Eneman, Geert; Veloso, Anabela; Favia, Paola; Hikavyy, Andriy; Porret, Clément; Arimura, Hiroaki; De Keersgieter, An; Pourtois, Geoffrey; Loo, Roger; Spessot, Alessio; Matagne, Philippe; Ryckaert, Julien; Horiguchi, Naoto (2020-08)

Stress simulations of fins, wires and nanosheets

Eneman, Geert; Veloso, Anabela; Favia, Paola; Hikavyy, Andriy; Porret, Clément; Arimura, Hiroaki; De Keersgieter, An; Pourtois, Geoffrey; Loo, Roger; Spessot, Alessio; Matagne, Philippe; Ryckaert, Julien; Horiguchi, Naoto (2020-07)

Analysis of the interface of RF-sputtered MoOx based hole-selective contacts for silicon heterojunction solar cells

Elsmani, Mohammed; Cho, Jinyoun; Recaman Payo, Maria; Gordon, Ivan; Tresso, Elena; Fatima, Noshin; Adib Ibrahim, Mohd; Sopian, Kamaruzzaman; Poortmans, Jef (2020)

Investigation of solder joint deformation under thermo-mechanical loading using DIC techniques

Eichhorst, Michael; Seiler, B.; Scheiter, L.; Vandevelde, Bart; Lauwaert, Ralph (2020)

Resampling and data augmentation for equines' behaviour classification based on wearable sensor accelerometer data using a convolutional neural network

Eerdekens, Anniek; Deruyck, Margot; Fontaine, Jaron; Martens, Luc; De Poorter, Eli; Plets, David; Joseph, Wout (2020-09)

Defectivity modulation in EUV resists through advanced filtration technologies

D'Urzo, Lucia; Umeda, T.; Mizuno, T.; Hattori, A.; Varanasi, R.; Singh, A.; Beera, R.; Foubert, Philippe; Vandereyken, Jelle; Drent, Waut (2020)

Fake people, real effects: the presence of virtual onlookers can impair performance and learning

Durnez, Wouter; Bombeke, Klaas; Joundi, Jamil; Zheleva, Aleksandra; cracco, emiel; Copman, Fran; Brass, Marcel; Saldien, Jelle; De Marez, Lieven (2020)

Conference contributions: Recent submissions

EUV lithography and the materials that propel it forward ﻿

Analysis and comparison of algorithms for the tomographic reconstruction of curved fibers ﻿

An adaptive probability map for the Discrete Algebraic Reconstruction Technique ﻿

Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes ﻿

Enhancing the quality of low temperature SiO2 by atomic hydrogen exposure for excellent NBTI reliability ﻿

Probing complexities of 3D-stacked ICs – A test engineers' perspective ﻿

A strong pockels PZT/Si modulator for efficient electro-optic tuning ﻿

Artificial Neural Network Regressor for Parametric Solder Strain Models for BGAs ﻿

BGA solder strain prediction using an Artificial Neural Network regressor ﻿

From passive to active human agency in artificial intelligence mediation ﻿

Contextualisation of data flow diagrams for security analysis ﻿

Towards the generalization of distributed software communication ﻿

Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography ﻿

Stress simulations of fins, wires and nanosheets ﻿

Stress simulations of fins, wires and nanosheets ﻿

Analysis of the interface of RF-sputtered MoOx based hole-selective contacts for silicon heterojunction solar cells ﻿

Investigation of solder joint deformation under thermo-mechanical loading using DIC techniques ﻿

Resampling and data augmentation for equines' behaviour classification based on wearable sensor accelerometer data using a convolutional neural network ﻿

Defectivity modulation in EUV resists through advanced filtration technologies ﻿

Fake people, real effects: the presence of virtual onlookers can impair performance and learning ﻿

EUV lithography and the materials that propel it forward

Analysis and comparison of algorithms for the tomographic reconstruction of curved fibers

An adaptive probability map for the Discrete Algebraic Reconstruction Technique

Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes

Enhancing the quality of low temperature SiO2 by atomic hydrogen exposure for excellent NBTI reliability

Probing complexities of 3D-stacked ICs – A test engineers' perspective

A strong pockels PZT/Si modulator for efficient electro-optic tuning

Artificial Neural Network Regressor for Parametric Solder Strain Models for BGAs

BGA solder strain prediction using an Artificial Neural Network regressor

From passive to active human agency in artificial intelligence mediation

Contextualisation of data flow diagrams for security analysis

Towards the generalization of distributed software communication

Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography

Stress simulations of fins, wires and nanosheets

Stress simulations of fins, wires and nanosheets

Analysis of the interface of RF-sputtered MoOx based hole-selective contacts for silicon heterojunction solar cells

Investigation of solder joint deformation under thermo-mechanical loading using DIC techniques

Resampling and data augmentation for equines' behaviour classification based on wearable sensor accelerometer data using a convolutional neural network

Defectivity modulation in EUV resists through advanced filtration technologies

Fake people, real effects: the presence of virtual onlookers can impair performance and learning