EISBN
978-1-5106-7223-9
ISBN
978-1-5106-7222-2
ISSN
0277-786X
Conference
Conference on Advanced Etch Technology and Process Integration for Nanopatterning XIII
Journal
Proceedings of SPIE
Volume
12958
Title
Process Optimization of MP18 Semi-Damascene Interconnects with Fully Self-Aligned Vias at Sub-2nm Nodes
Publication type
Proceedings paper