EISBN
978-1-5106-7215-4
ISBN
978-1-5106-7214-7
ISSN
0277-786X
Conference
Conference on DTCO and Computational Patterning III
Journal
Proceedings of SPIE
Volume
12954
Title
Source mask optimization ( SMO) study for high-NA EUV lithography to achieve single patterning on random logic metal
Publication type
Proceedings paper
Embargo date
2024-04-10