Browsing Presentations by imec author "247d279d7407cc434ff902db9a0e4bb3120e718d"
Now showing items 1-20 of 37
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Advanced surface preparation leading into the nano-era
Onsia, Bart; De Gendt, Stefan; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Conard, Thierry; Heyns, Marc; Lin, S.; Green, Martin; Tsai, Wilman (2003) -
ALD strontium titanates and their characterization
Popovici, Mihaela Ioana; Van Elshocht, Sven; Tomida, Kazuyuki; Menou, Nicolas; Swerts, Johan; Pawlak, Malgorzata; Kaczer, Ben; Kim, Min-Soo; Brijs, Bert; Favia, Paola; Conard, Thierry; Franquet, Alexis; Moussa, Alain; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Alternative high-k dielectrics for semiconductor applications
Van Elshocht, Sven; Adelmann, Christoph; Clima, Sergiu; Pourtois, Geoffrey; Conard, Thierry; Delabie, Annelies; Franquet, Alexis; Lehnen, Peer; Meersschaut, Johan; Menou, Nicolas; Popovici, Mihaela Ioana; Richard, Olivier; Schram, Tom; Wang, Xin Peng; Hardy, An; Dewulf, Daan; van Bael, M.K.; Blomberg, T.; Pieereux, D.; Swerts, J.; Maes, J.W.; Wouters, Dirk; De Gendt, Stefan; Kittl, Jorge (2008) -
Aqueous chemical solution deposition of LuFeO3 thin films in view of energy storage applications
Gielis, Sven; Peys, Nick; Dewulf, Daan; De Dobbelaere, C.; Pavlovic, N.; Damm, H.; Van Elshocht, Sven; De Gendt, Stefan; Vereecken, Philippe; Hardy, An; Van Bael, Marlies (2011) -
Aqueous chemical solution deposition of LuFeO3 thin high-k films
Gielis, Sven; Peys, Nick; Dewulf, D.; Pavlovic, N.; Van Elshocht, Sven; De Gendt, Stefan; Hardy, An; Van Bael, Marlies (2012) -
Atomic layer deposition as an enabling technology for fabrication of germanium MOS transistor
Eneman, Geert; Delabie, Annelies; Van Elshocht, Sven; De Jaeger, Brice; Nicholas, Gareth; Martens, Koen; Brunco, David; Zimmerman, Paul; Houssa, Michel; Pourtois, Geoffrey; Kaczer, Ben; Leys, Frederik; Winderickx, Gillis; Huyghebaert, Cedric; Terzieva, Valentina; Loo, Roger; Caymax, Matty; Meuris, Marc; Heyns, Marc (2007) -
Atomic layer deposition of HfO2 on single walled carbon nanotubes
Liyanage, Lucky; Cott, Daire; Delabie, Annelies; Van Elshocht, Sven; Wong, Philip (2011) -
Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru
Adelmann, Christoph; Popovici, Mihaela Ioana; Groven, Benjamin; Moens, Kristof; Meersschaut, Johan; Franquet, Alexis; Swerts, Johan; Delabie, Annelies; Van Elshocht, Sven (2014) -
Atomic layer deposition of scandium-based oxides
Nyns, Laura; Lisoni, Judit; Van den Bosch, Geert; Van Elshocht, Sven; Van Houdt, Jan (2013) -
Benefits and side effects of high temperature anneal used to reduce threading dislocation defects in epitaxial Ge layers on Si substrates
Terzieva, Valentina; Souriau, Laurent; Caymax, Matty; Brunco, David; Moussa, Alain; Van Elshocht, Sven; Loo, Roger; Meuris, Marc (2007) -
Deposition of barrier materials for interconnects
Van Elshocht, Sven (2012) -
Dielectrics as key enablers of today's and tomorrow's semiconductor technology
Van Elshocht, Sven (2018) -
Electrical characteristics of Ge/GeOx(N)/HfO2 gate stacks
Houssa, Michel; De Jaeger, Brice; Delabie, Annelies; Van Elshocht, Sven; Afanasiev, Valeri; Autran, J.L.; Stesmans, Andre; Meuris, Marc; Heyns, Marc (2004) -
Evaluation of Mn-based Cu barriers for interconnect applications
Van Besien, Els; Jourdan, Nicolas; Zhao, Larry; Croes, Kristof; Siew, Yong Kong; Van Elshocht, Sven; Tokei, Zsolt (2011) -
Gd(III)-Nb(V)-oxides: high-k materials screened by aqueous CSD
Dewulf, Daan; Hardy, An; Van Elshocht, Sven; Adelmann, Christoph; De Gendt, Stefan; Van Bael, Marlies (2010) -
Ge and III/V: the CMOS of the future
Heyns, Marc; Adelmann, Christoph; Bellenger, Florence; Brammertz, Guy; Brunco, David; Caymax, Matty; De Jaeger, Brice; Delabie, Annelies; Eneman, Geert; Houssa, Michel; Kaczer, Ben; Lin, Dennis; Martens, Koen; Meuris, Marc; Mitard, Jerome; Opsomer, Karl; Pourtois, Geoffrey; Satta, Alessandra; Scarrozza, Marco; Simoen, Eddy; Sioncke, Sonja; Souriau, Laurent; Terzieva, Valentina; Van Elshocht, Sven (2007) -
HfO2 by ALD and MOCVD on Ge
Zhao, Chao; Van Elshocht, Sven; Delabie, Annelies; Caymax, Matty (2004) -
In situ studies of Al2O3 ALD growth and self-cleaning on III-V surfaces by STM and XPS
Rodriguez, Leonard; De Clercq, Astrid; Tallarida, Massimo; Cuypers, Daniel; Locquet, Jean-Pierre; Van Elshocht, Sven; Adelmann, Christoph; Caymax, Matty (2012) -
Insight in Gd(III)-Nb(V)-oxides: high-k materials screened by aqueous CSD
Dewulf, Daan; Hardy, An; Van Elshocht, Sven; Adelmann, Christoph; Mullens, Jules; De Gendt, Stefan; Van Bael, Marlies (2010) -
Interface chemistry of Al2O3/III-V upon atomic layer deposition
Tallarida, Massimo; Adelmann, Christoph; Cuypers, Daniel; Rodriguez, Leonard; Lin, Dennis; Michling, Marcel; Friedrich, Daniel; De Clercq, Astrid; Delabie, Annelies; Van Elshocht, Sven; Locquet, Jean-Pierre; Caymax, Matty; Schmeisser, Dieter (2012)