Browsing Presentations by imec author "27a37eb93d57da8f5498cb3b91b45c92d374152c"
Now showing items 1-17 of 17
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Direct comparison of resist outgassing and optics contamination using in-band EUV photon exposure and e-beam exposure from several EUV sensitive resists
Perera, Rupert c.; Pollentier, Ivan; Underwood, James H.; Houser, David C. (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007) -
High throughput grating qualification of directed self-assembly patterns using optical metrology
Van Look, Lieve; Rincon Delgadillo, Paulina; Lee, Yu-tsung; Pollentier, Ivan; Gronheid, Roel; Cao, Yi; Lin, Guanyang; Nealey, Paul F. (2013) -
Imec update on resist outgassing qualification
Pollentier, Ivan; Lokasani, Ragava; Gronheid, Roel (2012) -
Integrations of Cu and low-k dielectrics: effect of hard mask dry etch and post-CMP clean on electrical performance of damascene structures
Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Grillaert, Joost; Fyen, Wim; Beyer, Gerald; Stucchi, Michele; Richard, Emmanuel; Vervoort, Iwan; De Roest, David; Maex, Karen (2000) -
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Hoffmann, Thomas; Storms, Greet; Vandenbroeck, Nadia; Delvaux, Christie; Ercken, Monique; Pollentier, Ivan; Ronse, Kurt; Takuji, Tada; Felten, Frank; Wong, Evelyn (2002) -
Line edge roughness and its increasing importance
Ercken, Monique; Storms, Greet; Delvaux, Christie; Vandenbroeck, Nadia; Leunissen, Peter; Pollentier, Ivan (2002) -
Optical testing of EUV pellicle materials
Pollentier, Ivan; Vanpaemel, Johannes; Zahedmanesh, Houman; Adelmann, Christoph; Huyghebaert, Cedric; Gallagher, Emily; Brose, Sasha; Danylyuk, Serhij; Bergmann, Klaus (2015) -
Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Lawrie, Kirsten; Blakey, Idriss; Blinco, James; Gronheid, Roel; Jack, Kevin; Pollentier, Ivan; Leeson, Michael; Younkin, Todd R.; Whittaker, Andrew K. (2009) -
Progress in understanding EUV resist related outgassing and contamination
Pollentier, Ivan; Lokasani, Ragava; Gronheid, Roel (2012) -
Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
Resist process development for the EUV alpha demo tool at IMEC
Goethals, Mieke; Niroomand, Ardavan; Van Roey, Frieda; Hermans, Jan; Lorusso, Gian; Baudemprez, Bart; Pollentier, Ivan; de Marneffe, Jean-Francois; Demuynck, Steven; Jonckheere, Rik; Ronse, Kurt (2008) -
Study of capping layer impact on reflectivity loss by carbon deposition
Jonckheere, Rik; Pollentier, Ivan; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt (2007) -
Thin photoresist layers for microelectronic devices: a comparative study between ToF and Orbitrap™ mass analyzers.
Spampinato, Valentina; Franquet, Alexis; De Simone, Danilo; Pollentier, Ivan; Vandenbroeck, Nadia; Pirkl, Alexander; Kayser, Sven; Vandervorst, Wilfried; van der Heide, Paul (2019) -
Update on EUV outgassing at imec
Pollentier, Ivan (2011) -
Update on resist outgassing qualification towards NXE3100
Pollentier, Ivan; Lokasani, Ragava; Gronheid, Roel (2012)