Browsing Presentations by imec author "ef81b9280b113989bed4db9958d4caa89e57b8a3"
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A high-reliable Cu/ULK integration scheme using Metal Hard Mask and Low-k capping film
Travaly, Youssef; Tsutsue, M.; Ikeda, Atsushi; Verdonck, Patrick; Tokei, Zsolt; Willegems, Myriam; Van Aelst, Joke; Struyf, Herbert; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Claes, Martine; Heylen, Nancy; Sinapi, Fabrice; Richard, Olivier; De Roest, David; Kaneko, S; Kemeling, N; Fukazawa, A; Matsuki, N; Matsushita, K; Tsuji, N; Kagami, K; Sprey, Hessel; Beyer, Gerald (2007) -
Application of porous low-k dielectrics and copper in microelectronics
Le, Quoc Toan; Baklanov, Mikhaïl; Claeys, Cor; Snow, Jim; Vanhaelemeersch, Serge (2005) -
Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine (2007) -
Effect of chemical solution on the stability of low-k films
Kesters, Els; Le, Quoc Toan; Baklanov, Mikhaïl; Boullart, Werner; Mertens, Paul (2004) -
Fundamental analysis of the collapse of nano-patterns during wet-processing of advanced interconnects
Zahedmanesh, Houman; Le, Quoc Toan; Vanstreels, Kris; Gonzalez, Mario; Tokei, Zsolt (2017) -
Modification of photoresist by UV for post-etch wet strip applications
Le, Quoc Toan; Kesters, Els; Claes, Martine; Lux, Marcel; Vereecke, Guy (2008) -
Particle removal efficiency and damage analysis of patterned wafers in different solvents after megasonic cleaning
Halder, Sandip; Bearda, Twan; Kenis, Karine; Janssens, Tom; Le, Quoc Toan; Wostyn, Kurt; Leunissen, Peter; Mertens, Paul (2008) -
Restoration of surface and bulk properties of ash plasma-treated porous low-k dielectrics
Le, Quoc Toan; Struyf, Herbert; Baklanov, Mikhaïl; Boullart, Werner; Kesters, Els; Van Puymbroeck, Jan; Vanhaelemeersch, Serge (2005) -
Selection of ESH solvents for cleaning applications in semiconductor manufacturing
Kesters, Els; Claes, Martine; Le, Quoc Toan; Barthomeuf, Kevin; Lux, Marcel; Vereecke, Guy; Bearda, Twan; Durkee, John (2008) -
Wafer level detection of sealing defects
Le, Quoc Toan; Holsteyns, Frank; Iacopi, Francesca; Maex, Karen (2003)