Recently added

Exploring Ge and III-V devices to scale CMOS beyond the Si roadmap

Heyns, Marc (2012)

Electrodes, interface materials, and architectures to enhance the efficiency and lifetime of organic photovoltaic cells

Heremans, Paul; Hadipour, Afshin; Voroshazi, Eszter; Cheyns, David; Rand, Barry (2012)

Functional films for printed electronics, display, OLED: future developments

Heremans, Paul (2012)

EUV Lithography in pre-production mode

Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012)

EUV Lithography in pre-production mode

Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012)

ASML NXE:3100 pre-production EUV scanner performance at imec

Hendrickx, Eric (2012)

Chemical solution synthesis and deposition of nanostructured metal oxides

Hardy, An; De Dobbelaere, C.; Van Bael, Marlies (2012)

Metal oxides in PV: opportunities and challenges

Hardy, An (2012)

Nanoscopic controlled material removal using diamond tips

Hantschel, Thomas; Schulze, Andreas; Tsigkourakos, Menelaos; Arstila, Kai; Moussa, Alain; Eyben, Pierre; Vandervorst, Wilfried (2012)

Implementation of self-assembly in a 300mm processing environment

Gronheid, Roel; Singh, Arjun; Rincon Delgadillo, Paulina; Nealey, Paul; Younkin, Todd (2012)

Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers

Gronheid, Roel; Singh, Arjun; Chan, BT; Rincon Delgadillo, Paulina; Nealey, Paul; Younkin, Todd; Romo Negreira, Ainhoa; Somervell, Mark; Tahara, Shigeru; Nafus, Kathleen (2012)

Implementation of self-assembly in a 300mm processing environment

Gronheid, Roel; Rincon Delgadillo, Paulina; Nealey, Paul; Younkin, Todd; Matsunaga, Koichi; Somervell, Mark; Nafus, Kathleen (2012)

Implementation of self-assembly in a 300mm processing environment

Gronheid, Roel; Rincon Delgadillo, Paulina; Nealey, Paul; Younkin, Todd (2012)

Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program

Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012)

The future of CMOS device reliability assessment: from individual traps to circuit simulations

Groeseneken, Guido; Kaczer, Ben; Toledano Luque, Maria; Franco, Jacopo; Roussel, Philippe (2012)

Quo vadis crystalline silicon PV ?

Gordon, Ivan (2012)

Thermo-mechanical reliability of electronic packages

Gonzalez, Mario (2012)

Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe (2012)

Development an evaluation of chemical interfaces for a nanophotonic silicon-on-insulator biosensor platform

Goes, A.; Werquin, Sam; Vanderleyden, E.; Bienstman, Peter; Dubruel, P. (2012)

Aqueous chemical solution deposition of LuFeO3 thin high-k films

Gielis, Sven; Peys, Nick; Dewulf, D.; Pavlovic, N.; Van Elshocht, Sven; De Gendt, Stefan; Hardy, An; Van Bael, Marlies (2012)

Presentations: Recent submissions

Exploring Ge and III-V devices to scale CMOS beyond the Si roadmap ﻿

Electrodes, interface materials, and architectures to enhance the efficiency and lifetime of organic photovoltaic cells ﻿

Functional films for printed electronics, display, OLED: future developments ﻿

EUV Lithography in pre-production mode ﻿

EUV Lithography in pre-production mode ﻿

ASML NXE:3100 pre-production EUV scanner performance at imec ﻿

Chemical solution synthesis and deposition of nanostructured metal oxides ﻿

Metal oxides in PV: opportunities and challenges ﻿

Nanoscopic controlled material removal using diamond tips ﻿

Implementation of self-assembly in a 300mm processing environment ﻿

Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers ﻿

Implementation of self-assembly in a 300mm processing environment ﻿

Implementation of self-assembly in a 300mm processing environment ﻿

Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program ﻿

The future of CMOS device reliability assessment: from individual traps to circuit simulations ﻿

Quo vadis crystalline silicon PV ? ﻿

Thermo-mechanical reliability of electronic packages ﻿

Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100 ﻿

Development an evaluation of chemical interfaces for a nanophotonic silicon-on-insulator biosensor platform ﻿

Aqueous chemical solution deposition of LuFeO3 thin high-k films ﻿

Exploring Ge and III-V devices to scale CMOS beyond the Si roadmap

Electrodes, interface materials, and architectures to enhance the efficiency and lifetime of organic photovoltaic cells

Functional films for printed electronics, display, OLED: future developments

EUV Lithography in pre-production mode

EUV Lithography in pre-production mode

ASML NXE:3100 pre-production EUV scanner performance at imec

Chemical solution synthesis and deposition of nanostructured metal oxides

Metal oxides in PV: opportunities and challenges

Nanoscopic controlled material removal using diamond tips

Implementation of self-assembly in a 300mm processing environment

Contact hole CD uniformity repair through directed self-assembly of cylindrical phase block copolymers

Implementation of self-assembly in a 300mm processing environment

Implementation of self-assembly in a 300mm processing environment

Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program

The future of CMOS device reliability assessment: from individual traps to circuit simulations

Quo vadis crystalline silicon PV ?

Thermo-mechanical reliability of electronic packages

Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

Development an evaluation of chemical interfaces for a nanophotonic silicon-on-insulator biosensor platform

Aqueous chemical solution deposition of LuFeO3 thin high-k films