Browsing by Author "Berry, Ivan"
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Publication Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films
Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
Meeting abstract2008, Advanced Metallization Conference - AMC, 23/09/2008Publication Improved low-k dielectric properties using He/H2 plasma for resist removal
Publication Metrology for implanted Si substrate and dopant loss studies
Proceedings paper2009, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 11, 4/10/2009, p.367-374Publication Metrology for implanted Si substrate loss studies
Journal article2010, Journal of the Electrochemical Society, (157) 5, p.H580-H584Publication Non-oxidizing solvent-based strip of ion implanted photoresist
Meeting abstract2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Surfaces, 20/09/2010Publication Non-oxidizing solvent-based strip of ion implanted photoresist
Journal article2012, Solid State Phenomena, 187, p.97-100Publication Optimization of post ion implant ash plasma and clean for ultra shallow extension/halo implantation
Meeting abstract2011, 4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM, 5/05/2011Publication Post extension ion implant photo resist strip for 32 nm technology and beyond
Oral presentation2008, 9th International Symposium on Utra Clean Processing of Semiconductor Surfaces - UCPSSPublication Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent
Journal article2011, Journal of the Electrochemical Society, (158) 2, p.H150-H155Publication UV-assisted curing: an effective technique for toughening of low-k organosilicate films