Browsing by Author "Besling, W."
Now showing 1 - 7 of 7
- Results Per Page
- Sort Options
Publication Application of x-ray fluorescence spectrometry in charaterization of high-k uktra-thin films
; ; ; Besling, W.Proceedings paper2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.243-250Publication Growth and characterization of atomic layer deposited WC0.7N0.3 on polymer films
Publication In-line electrical metrology for high-k gate dielectrics deposited by atomic layer chemical vapour deposition
Journal article2002-09, Semiconductor Fabtech, 17, p.111-115Publication Integration of ALD WCN into a dual damascene oxide module
Proceedings paper2003, Proceedings of the Advanced Metallization Conference 2002, 1/10/2002, p.759-765Publication Nucleation and growth of TiN films deposited by atomic layer deposition
Proceedings paper2002, Proceedings of the 3rd AVS International Conference on Microelectronics and Interfaces, 11/02/2002, p.52-54Publication Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy
Proceedings paper2003, Proceedings of the Advanced Metallization Conference 2002, 1/10/2002, p.717-723Publication TOF-SIMS as a rapid diagnostic tool to monitor the growth mode of thin (high k) films
Journal article2003, Applied Surface Science, 203-204, p.400-403