Browsing by Author "Blomberg, T."
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Publication 0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Proceedings paper2008, Technical Digest International Electron Devices Meeting - IEDM, 15/12/2008, p.929-632Publication Alternative high-k dielectrics for semiconductor applications
Journal article2009, Journal of Vacuum Science and Technology B, (27) 1, p.209-213Publication Alternative high-k dielectrics for semiconductor applications
Oral presentation2008, 15th Workshop on Dielectrics in Microelectronics - WODIMPublication Atomic layer deposition: an enabling technology for microelectronic device manufacturing
; ; Publication High-k dielectrics and metal gates for future generation memory devices
; ; ; Wang, Xin PengMeeting abstract2009, 215th ECS Meeting, 24/05/2009, p.690Publication High-k dielectrics and metal gates for future generation memory devices
; ; ; Wang, Xin PengProceedings paper2009, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS. 5: New Materials, Processing, and Equipment, 24/05/2009, p.29-40Publication High-k dielectrics for future generation memory devices
; ; ; Wang, Xin PengJournal article2009, Microelectronic Engineering, (86) 7_9, p.1789-1795Publication Sr-Cp precursor based ALD SrTiO3 for capacitor applications
Proceedings paper2008, 8th International Conference on Atomic Layer Deposition - ALD, 29/06/2008