Browsing by Author "Delie, Gilles"

Airgap Integration in MP18 Two-Level Semi-damascene Interconnects with Fully Self-aligned Vias

Demonstration of MP18-26nm Ru Semi-Damascene Spacer-is-Dielectric SADP Integration

Energy band alignment in MoS₂/HfO₂: Transfer-related artifacts and interfacial effects

Impact of CVD chemistry on band alignment at the MoS2/SiO2 interface

Ion Beam Deposition of Ruthenium for Interconnect Applications in a Direct Metal Etch Approach

Leakage and TDDB Mechanisms in 18 nm Pitch Direct Metal Etch Ru Interconnects with Airgaps

MP16/18 Integration in Ru Semi-Damascene using SiN-Based Core for Spacer-is-Dielectric SADP

Optimized Two Metal Level Semi-Damascene Interconnects For Superconducting Digital Logic

Redefining 2-Level Semi-Damascene Interconnect Technology: Benchmarking three different Fully Self-aligned Via options

Robust Overlay Control in 2-Level Semi-Damascene

Selecting alternative metals for advanced interconnects

Self-aligned 8nm T2T as cell boundary in the middle-of-line

Thermally-Induced Morphology Changes in Subtractive Ru Lines and Their Mitigation

Two-level Semi-damascene interconnect with fully self-aligned Vias at MP18

Two-metal-level semi-damascene interconnect with variable width bottom metal at metal pitch 18-26 nm and aspect ratio 4-6 routed using fully self-aligned via

UV surface pre-treatment and wet cleaning of Ruthenium MP18 semi-damascene structures

Variability of band alignment between WS2 and SiO2: Intrinsic versus extrinsic contributions