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Browsing by Author "Eyckens, Brenda"

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    Characterization of the growth of atomic layer deposited WNxCy films on various substrates

    Martin Hoyas, Ana
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    Travaly, Youssef
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    Schuhmacher, Jorg
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    Sajavaara, Timo
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    Whelan, Caroline
    Oral presentation
    2005, AVS 2005
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    Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films

    Iacopi, Francesca
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    Waldfried, Carlo
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    Abell, Thomas
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    Guyer, Eric
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    Eyckens, Brenda
    Oral presentation
    2005, MRS Spring Meeting Symposium B: Materials, Technology and Reliability of Advanced Interconnects
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    Growth and characterization of atomic layer deposited WCxNy

    Martin Hoyas, Ana
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    Travaly, Youssef
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    Schuhmacher, Jorg
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    Sajavaara, T.
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    Whelan, Caroline
    Oral presentation
    2005, AVS 5th International Conference on Microelectronics and Interfaces (ICMI)
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    Highly reliable and extremely stable SiGe micro-mirrors

    Gromova, Maria
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    Haspeslagh, Luc  
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    Verbist, Agnes
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    Du Bois, Bert  
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    Van Hoof, Rita  
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    Eyckens, Brenda
    Proceedings paper
    2007-01, Technical Digest 20th IEEE International Micro Electro Mechanical Systems Conference - MEMS, 21/01/2007, p.759-762
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    Impact of LKD5109 low-k to cap/liner interfaces in single damascene process and performance

    Iacopi, Francesca
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    Patz, Michael
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    Vos, Ingrid  
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    Tokei, Zsolt  
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    Sijmus, Bram
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    Le, Quoc Toan  
    Journal article
    2003, Microelectronic Engineering, (70) 2_4, p.293-301
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    Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

    Travaly, Youssef
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    Eyckens, Brenda
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    Carbonell, Laure
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    Rothschild, Aude
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    Le, Quoc Toan  
    Journal article
    2002, Microelectronic Engineering, (64) 1_4, p.367-374
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    Integration of single damascene 85/85nm/L/S copper trenches in black diamond using 193nm optical lithography with dipole illumination

    Van Olmen, Jan  
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    Wu, Wen
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    Van Hove, Marleen
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    Travaly, Youssef
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    Brongersma, Sywert  
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    Eyckens, Brenda
    Proceedings paper
    2003, Proceedings of the IEEE International Interconnect Technology Conference - IITC, 2/06/2003, p.171-173
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    Performance improvement of tall triple gate devices with strained SiN layers

    Collaert, Nadine  
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    De Keersgieter, An  
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    Kottantharayil, Anil
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    Rooyackers, Rita
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    Eneman, Geert  
    Journal article
    2005-11, IEEE Electron Device Letters, (26) 11, p.820-822
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    Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey

    Deweerd, Wim
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    Kaushik, Vidya
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    Chen, J.
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    Shimamoto, Y.
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    Schram, Tom  
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    Ragnarsson, Lars-Ake  
    Journal article
    2005-01, Microelectronics Reliability, (45) 5_6, p.786-789
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    Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey

    Deweerd, Wim
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    Kaushik, Vidya
    ;
    Chen, J.
    ;
    Shimamoto, Y.
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    Ragnarsson, Lars-Ake  
    ;
    Delabie, Annelies  
    Proceedings paper
    2004, 13th Workshop on Dielectrics in Microelectronics - WODIM, 28/06/2004
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    Process optimization of low temperature silicon nitride stressor layers for improvement of device performance for 45nm technology and below

    Eyckens, Brenda
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    Collaert, Nadine  
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    Schaekers, Marc  
    ;
    Sleeckx, Erik  
    ;
    Eneman, Geert  
    Oral presentation
    2005, 8th Technical and Scientific Meeting of CREMSI 8th Technical and Scientific Meeting of CREMSI

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