Browsing by Author "Eyckens, Brenda"
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Publication Characterization of the growth of atomic layer deposited WNxCy films on various substrates
;Martin Hoyas, Ana ;Travaly, Youssef ;Schuhmacher, Jorg ;Sajavaara, TimoWhelan, CarolineOral presentation2005, AVS 2005Publication Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films
;Iacopi, Francesca ;Waldfried, Carlo ;Abell, Thomas ;Guyer, EricEyckens, BrendaOral presentation2005, MRS Spring Meeting Symposium B: Materials, Technology and Reliability of Advanced InterconnectsPublication Growth and characterization of atomic layer deposited WCxNy
;Martin Hoyas, Ana ;Travaly, Youssef ;Schuhmacher, Jorg ;Sajavaara, T.Whelan, CarolineOral presentation2005, AVS 5th International Conference on Microelectronics and Interfaces (ICMI)Publication Highly reliable and extremely stable SiGe micro-mirrors
Proceedings paper2007-01, Technical Digest 20th IEEE International Micro Electro Mechanical Systems Conference - MEMS, 21/01/2007, p.759-762Publication Impact of LKD5109 low-k to cap/liner interfaces in single damascene process and performance
Journal article2003, Microelectronic Engineering, (70) 2_4, p.293-301Publication Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Journal article2002, Microelectronic Engineering, (64) 1_4, p.367-374Publication Integration of single damascene 85/85nm/L/S copper trenches in black diamond using 193nm optical lithography with dipole illumination
Proceedings paper2003, Proceedings of the IEEE International Interconnect Technology Conference - IITC, 2/06/2003, p.171-173Publication Performance improvement of tall triple gate devices with strained SiN layers
Journal article2005-11, IEEE Electron Device Letters, (26) 11, p.820-822Publication Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Journal article2005-01, Microelectronics Reliability, (45) 5_6, p.786-789Publication Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey
Proceedings paper2004, 13th Workshop on Dielectrics in Microelectronics - WODIM, 28/06/2004Publication Process optimization of low temperature silicon nitride stressor layers for improvement of device performance for 45nm technology and below
Oral presentation2005, 8th Technical and Scientific Meeting of CREMSI 8th Technical and Scientific Meeting of CREMSI