Browsing by Author "Gao, Weimin"
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Publication A fast triple patterning solution with fix guidance
Proceedings paper2014, Design-Process-Technology Co-optimization for Manufacturability VIII, 23/02/2014, p.90530APublication Accurate models for EUV simulation and their use for design correction
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Application of an inverse Mack model for negative tone development simulation
Publication Binary modeling method to check the sub-resolution assist features (SRAFs) printability
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83261DPublication Calibration and verification of a stochastic model for EUV resist
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83221DPublication Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.105830OPublication Double patterning OPC and design for 22nm to 16nm device nodes
Publication EDA perspective on manufacturable DPT solutions
Oral presentation2010, 7th Annual LithoVision Technical SymposiumPublication EUV modeling accruracy and integration requirements for the 16nm node
Publication Experimental characterization of NTD rResist shrinkage
Proceedings paper2017, Optical Microlithography XXX, 26/02/2017, p.101470FPublication Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Publication Experimental validation of stochastic modeling for negative-tone develop EUV resist
Proceedings paper2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.942223Publication Fullfield 27nm CD control and modeling
; ; ; ; ; Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 17/10/2010Publication Impact of EUV off-axis illumination on full field imaging performance for NXE:3100
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication Impact of litho-patterning variations on the electrical performance and variability of advanced interconnects
Proceedings paper2018, 25th Lithography Workshop, 17/06/2018, p.18Publication Intrinisic reliability of local interconnects for N7 and beyond
Proceedings paper2015, IEEE International Reliability Physics Symposium - IRPS, 19/04/2015, p.2A.3Publication Investigation of titanium nitride coating by broadband laser ultrasonic spectroscopy
Publication Laser ultrasonic study of Lamb waves: determination of the thickness and velocities of a thin plate
Publication Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithograpgy VIII, 26/02/2017, p.101430IPublication Modeling of via resistance for advanced technology nodes
; ; ; Journal article2017, IEEE Transactions on Electron Devices, (64) 5, p.2306-2313