Browsing by Author "Gräf, D."
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Publication Cleaning of metal contamination
Proceedings paper1994, Contamination Control and Defect Reduction in Semiconductor Manufacturing III, 23/05/1994, p.241-252Publication Cleaning technology for highly reliable gate oxides
Proceedings paper1994, Proceedings of the International Conference on Advanced Microelectronic Devices and Processing - AMDP, 03/03/1994, p.59-66Publication Correlation between grown-in silicon substrate defects and silicon gate oxide breakdown characteristics
Meeting abstract1996, Belgische Natuurkundige Vereniging. Algemene Wetenschappelijke Vergadering, 6/06/1996Publication Critical processes for ultra-thin gate oxide integrity
; ; ; Publication Defects in As-grown silicon and their evolution during heat treatments
Publication Differential interference contrast microscopy of defects in As-grown and annealed Si wafers
Proceedings paper1997, Proceedings of the 7th International Autumn Meeting : Gettering and Defect Engineering in Semiconductor Technology - GADEST '97, 5/10/1997, p.387-392Publication Effect of Fe contamination on quality of poly silicon gate structures
; ; ; ; Publication Effect of oxidation ramp up on the redistribution of metallic contamination in gate oxides
Proceedings paper1994, Proceedings of the Institute of Environmental Science: 40th Annual Technical Meeting, 01/05/1994, p.325-331Publication Environmentally-friendly chlorine during oxidation
; ; ; Publication Evaluation of Si surface conditions by the use of surface photovoltage technique
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.455-462Publication Extraction of the carrier generation and recombination lifetime from the forward characteristics of advanced diodes
Oral presentation2002, E-MRS Spring Meeting Symposium E: Advanced Characterisation of Semiconductor Materials and DevicesPublication Extraction of the carrier generation and recombination lifetime from the forward characteristics of advanced diodes
Journal article2003, Materials Science and Engineering B, (102) 1_3, p.189-192Publication Grown-in defect density spectra in czochralski silicon wafers
Publication How clean is clean enough?
Proceedings paper1995, Proceedings of SEMICON/West 1995 Technical Seminar: Cleaning Technology for the Submicron Era, 11/07/1995, p.7Publication Impact of state-of-the-art Cz substrates on the current-voltage characteristics of shallow p-n junctions
Proceedings paper2002, Semiconductor Silicon 2002. Proceedings of the 9th International Symposium on Silicon Materials Science and Technology, 13/05/2002, p.695-704Publication Investigation of crystal defects in As-grown and processed silicon wafers and heteroepitaxial layers by infrared light scattering
Publication IR and MW absorption techniques for bulk and surface recombination control in high-quality silicon
Proceedings paper1995, Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation, 17/04/1995, p.389-394Publication IR-LST a powerful non-invasive tool to observe crystal defects in as-grown silicon, after device processing, and in heteroepitaxial layers
Publication Lattice defects in high quality as-grown CZ silicon, studied with light scattering and preferential etching techniques
; ; Lambert, U.Proceedings paper1995, Proceedings 18th International Conference on Defects in Semiconductors - ICDS-18; July 23 -28, 1995; Sendai, Japan., 23/07/1995, p.1755-1760Publication Light scattering tomography study of lattice defects in high quality as-grown Cz silicon wafers and their evolution during gate oxidation
; ; Lambert, U.Proceedings paper1996, Defect Recognition and Image Processing in Semiconductors - DRIP. Proceedings of the 6th International Conference, 3/12/1995, p.331-336