Browsing by Author "Hansen, Terje"
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Publication Challenges for smoothing EUV photoresist line-width-roughness: plasma treatment from 40 to 22 nm half pitches
Oral presentation2013, China Semiconductor Technology International Conference (CSTIC) 2013Publication Line edge and width roughness mitigation at 22nm half pitch: plasma polymer interaction and roughness mitigation through etch
Meeting abstract2013, Plasma Etch and Strip in Microtechnology - PESM, 14/03/2013Publication Line edge and width roughness smoothing by plasma treatment
Proceedings paper2013, Advanced Etch Technology for Nanopatterning II, 24/02/2013, p.868505Publication Line edge and width roughness smoothing by plasma treatment
Journal article2014, Journal of Micro/Nanolithography MEMS and MOEMS, (13) 2, p.23006Publication Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
Journal article2015, Plasma Processes and Polymers, (12) 2, p.153-161Publication Plasma influence on the attenuation of line width roughness of EUV photoresist lines ranging from 40 to 22 nm half pitch
Oral presentation2013, SPIE Advanced Lithography ConferencePublication The influence of the initial LWR, CD and EUV-resist composition on LWR reduction by H2 plasma treatment
Meeting abstract2014, SPIE Advanced Lithography, 22/02/2014Publication Vacuum ultra-violet emission of CF4 & CF3I containing plasmas and their effect on low-k materials
Journal article2015, Journal of Physics D: Applied Physics, (48) 39, p.395202Publication XAS photoresists electron/quantum yields study with synchrotron light
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942507