Browsing by Author "Kawakami, Shinichiro"
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Publication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Publication EUV patterning improvement toward high-volume manufacturing
Meeting abstract2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94221XPublication EUV process establishment through litho and etch for N7 node
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97760CPublication Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Proceedings paper2014, Advances in Patterning Materials and Processes XXXI, 23/02/2014, p.905108Publication Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)
Publication Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Publication Recent advances in EUV patterning in preparation towards high-NA EUV
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981GPublication Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Publication Technology for defectivity improvement in resist coating and developing process in EUV lithography process