Browsing by Author "Knotter, D. M."
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Publication A novel resist and post-etch residue removal process using ozonated chemistries
Proceedings paper1998, IEEE VLSI Technology Symposium, 9/09/1998, p.168-169Publication A novel resist and post-etch residue removal process using ozonated chemistry
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.165-168Publication Advanced cleaning and ultra-thin oxide technology
; ; ; ; Publication Cost-effective cleaning and high-quality thin gate oxides
Journal article1999, IBM Journal of Research and Development, (43) 3, p.339-350Publication Cost-effective cleaning for advanced Si-processing
; ; ; Publication Efficiency of ozonated DI water in removing organic contamination
Proceedings paper1998, Proceedings of the 5th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 31/08/1997, p.247-255Publication Hydrogen peroxide decomposition in ammonia solutions
Journal article1999, J. Electrochem. Soc., (146) 9, p.3476-3481Publication Hydrogen peroxide decomposition in ammonia solutions
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.15-18Publication Hydrogen peroxide decomposition in ammonin solutions
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Impact of iron contamination and roughness generated in ammonia hydrogen peroxide mixtures (SC1) on 5nm gate oxides
Journal article1998, J. Electrochem. Soc., (145) 7, p.2589-2594Publication Impact of iron contamination and SC1 generated roughness on 5nm gate oxides
Oral presentation1997, Productronica Conference : Semiconductor Equipment and Materials - Contamination Control and Defect Reductions; 11-14 November 1Publication Impact of organic contamination on thin gate oxide quality
Journal article1998, Japanese Journal of Applied Physics. Part 1: Regular Papers, (37) 9A, p.4649-4655Publication In-homogeneous precipitation of iron from SC1 solutions
Proceedings paper1997, Science and Technology of Semiconductor Surface Preparation, 1/04/1997, p.63Publication Removal of organic contamination from silicon surfaces
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.107-110Publication Silicon surface metal contamination measurements using grazing-emission XRF spectrometry
Proceedings paper1997, Science and Technology of Semiconductor Surface Preparation, 1/04/1997, p.397-402Publication Silicon surface roughening in an iron contaminated SCl bath
Proceedings paper1996, Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 23/09/1996, p.103-106Publication Silicon surface roughening mechanisms in ammonia hydrogen peroxide mixtures
Journal article2000, Journal of the Electrochemical Society, (147) 2, p.736-740Publication Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.93-96