Browsing by Author "Kolbe, Michael"
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Publication ALD on high mobility channels: engineering the proper gate stack passivation
Proceedings paper2010, Atomic Layer Deposition Applications 6, 10/10/2010, p.9-23Publication Determination of optical constants of thin films in the EUV
Journal article2022, APPLIED OPTICS, (61) 8, p.2060-2078Publication Interface sharpness in stacked thin film structures: a comparison of soft X-ray reflectometry and transmission electron microscopy
Journal article2024, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (23) 4, p.Art. 041405Publication Optical constants for EUV scatterometry
Proceedings paper2021, Modeling Aspects in Optical Metrology VII, 21/06/2021, p.117830MPublication Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range
Proceedings paper2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124963BPublication Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Publication S-passivation of the Ge gate stack using (NH4)2S
Meeting abstract2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS, 20/09/2010, p.7.4Publication Soft X-ray reflectometry for the inspection of interlayer roughness in stacked thin film structures
Proceedings paper2024, Conference on Metrology, Inspection, and Process Control XXXVIII, FEB 26-29, 2024, p.Art. 1295507Publication Study of EUV reticle storage effects through exposure on EBL2 and NXE
Proceedings paper2020, Extreme Ultraviolet Lithography 2020, 21/09/2020, p.115170ZPublication Towards passivation of Ge(100) surfaces by sulfur adsorption from (NH4)2S solution: a combined NEXAFS, STM and LEED study
Journal article2011, Journal of the Electrochemical Society, (158) 5, p.H589-H594