Browsing by Author "Kraus, Harald"
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Publication A study in interactions of plasmas and wet cleans with ULK materials
; ; ; ; Publication Advanced wafer surface cleaning technology
Oral presentation2004, SEMICON Korea 2004 STS, S5: Contamination-free Manufacturing SeminarPublication Cleaning of metal gate stacks for the sub 90nm technology node
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on CLeaning Technology in Semiconductor Device Manufacturing, 12/10/2003Publication Cleaning of metal gate stacks for the sub 90nm technology node
Proceedings paper2004, Cleaning Technology in Semiconductor Device Manufacturing VIII. Proceedings of the International Symposium, 12/10/2003, p.393-399Publication Drying of hydrophobic surfaces - one of the keys for future technologies
Meeting abstract2004, Advanced Semiconductor Manufacturing Conference - ASMC, 4/05/2004Publication Etching and cleaning of HfO2 deposited on Si
Proceedings paper2002-11, The 1st International Surface Cleaning Workshop, 11/11/2002Publication Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues
Oral presentation2003, Twelfth International Symposium on Semiconductor Manufacturing - ISSMPublication Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing, 13/10/2003Publication Integration of high-K gate dielectrics - wet etch, cleaning and surface conditioning
Proceedings paper2004, Cleaning Technology in Semiconducting Device Manufacturing VIII. Proceedings of the International Symposium, 13/10/2003, p.67-77Publication Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Meeting abstract2003, 204th Meeting of the Electrochemical Society: 2nd Int. Symp. on High Dielectric Constant Materials, 13/10/2003Publication Method for determining the effectiveness of silicon nitride as a barrier layer for HfO2
Proceedings paper2004, Physics and Technology of High-k Gate Dielectrics II, 12/10/2003, p.47-57Publication Modifications of porous low-k by plasma treatments and wet cleans
; ; ; ; Publication Post salicidation clean: selective removal of un-reacted NiPt towards NiPtSi(Ge)
Proceedings paper2007, Cleaning and Surface Conditioning Technology in Semiconductor Device Manufacturing 10, 7/10/2007, p.327-334Publication Removing metal gate process residues
Journal article2004, European Semiconductor, (26) 4, p.61-62Publication Rinsing and drying issues during the post CMP cleaning process
; ; ; ; Proceedings paper2004, 21st International VLSI Multilevel Interconnection Conference - VMIC, 30/09/2004, p.112-119Publication Selective etching of SiGe for removal of dummy layers in fully silicided gate artchitectures
Proceedings paper2005, Cleaning Technology in Semiconductor Device Manufacturing IX, 17/10/2005, p.207-213Publication Selective single-wafer wet etching of Hf-based layers
Journal article2005, Semiconductor Fabtech, 28, p.115-120Publication Selective wet etching of Hf-based layers
Oral presentation2004, Sematech Wafer Clean & Surface Prep ConferencePublication Selective wet etching of Hf-based layers on a single-wafer spin processor
; ; ; Proceedings paper2004, Proceedings of the 3rd International Conference on Semiconductor Technology - ISTC, 15/09/2004, p.485-492Publication Selective wet etching of nickel
Proceedings paper2005-04, SEMATECH Wafer Clean & Surface Prep Conference, 18/04/2005