Repository logo Institutional repository
  • Communities & Collections
  • Browse
  • Site
Search repository
High contrast
  1. Home
  2. Browse by Author

Browsing by Author "Kuwahara, Yuhei"

Filter results by typing the first few letters
Now showing 1 - 12 of 12
  • Results Per Page
  • Sort Options
  • Loading...
    Thumbnail Image
    Publication

    Advances and challenges in dual-tone development process optimization

    Fonseca, Carlos
    ;
    Somervell, Mark
    ;
    Scheer, Steven  
    ;
    Printz, Wallace
    ;
    Nafus, Kathleen  
    Proceedings paper
    2009, Optical Microlithography XXII, 22/02/2009, p.72740I
  • Loading...
    Thumbnail Image
    Publication

    Advances in dual-tone development for pitch frequency doubling

    Fonseca, Carlos
    ;
    Somervell, Mark
    ;
    Scheer, Steven  
    ;
    Kuwahara, Yuhei
    ;
    Nafus, Kathleen  
    Proceedings paper
    2010, Optical Microlithography XXIII, 21/02/2010, p.76400E
  • Loading...
    Thumbnail Image
    Publication

    Approaches to Enable Patterning of Tight Pitches towards High NA EUV

    Tadatomo, Hiroki
    ;
    Dauendorffer, Arnaud
    ;
    Onitsuka, Tomoya
    ;
    Genjima, Hisashi
    ;
    Ido, Yasuyuki
    Proceedings paper
    2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.120560F
  • Loading...
    Thumbnail Image
    Publication

    Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation

    Sayan, Safak
    ;
    Tao, Zheng  
    ;
    Chan, BT  
    ;
    De Simone, Danilo  
    ;
    Kuwahara, Yuhei
    ;
    Nafus, Kathleen  
    Proceedings paper
    2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942516
  • Loading...
    Thumbnail Image
    Publication

    EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing

    Dinh, Cong Que
    ;
    Nagahara, Seiji
    ;
    Kuwahara, Yuhei
    ;
    Dauendorffer, Arnaud
    ;
    Yoshida, Keisuke
    Journal article
    2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93
  • Loading...
    Thumbnail Image
    Publication

    EUV patterning improvement toward high-volume manufacturing

    Kuwahara, Yuhei
    ;
    Matsunaga, Koichi
    ;
    Kawakami, Shinichiro
    ;
    Nafus, Kathleen  
    ;
    Foubert, Philippe  
    Meeting abstract
    2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94221X
  • Loading...
    Thumbnail Image
    Publication

    EUV process establishment through litho and etch for N7 node

    Kuwahara, Yuhei
    ;
    Kawakami, Shinichiro
    ;
    Kubota, Minoru
    ;
    Matsunaga, Koichi
    ;
    Nafus, Kathleen  
    Proceedings paper
    2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97760C
  • Loading...
    Thumbnail Image
    Publication

    Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

    Rathsack, Ben
    ;
    Scheer, Steven  
    ;
    Kuwahara, Yuhei
    ;
    Kitano, Junichi
    ;
    Gronheid, Roel  
    Proceedings paper
    2008, Advances in Resist Materials and Processing Technology XXV, 24/02/2008, p.692315
  • Loading...
    Thumbnail Image
    Publication

    Manufacturability improvements in EUV resist processing towards NXE:3300 processing

    Kuwahara, Yuhei
    ;
    Matsunaga, Koichi
    ;
    Shimoaoki, Takeshi
    ;
    Kawakami, Shinichiro
    ;
    Nafus, Kathleen  
    Proceedings paper
    2014, Advances in Patterning Materials and Processes XXXI, 23/02/2014, p.905108
  • Loading...
    Thumbnail Image
    Publication

    Novel metal containing resists for EUV lithography extendibility

    De Simone, Danilo  
    ;
    Sayan, Safak
    ;
    Dei, Satoshi
    ;
    Pollentier, Ivan  
    ;
    Kuwahara, Yuhei
    Proceedings paper
    2016, Extreme Ultravioelt (EUV) Lithography, 21/02/2016, p.977606
  • Loading...
    Thumbnail Image
    Publication

    Recent advances in EUV patterning in preparation towards high-NA EUV

    Nagahara, Seiji
    ;
    Dauendorffer, Arnaud  
    ;
    Thiam, Arame  
    ;
    Liu, Xiang  
    ;
    Kuwahara, Yuhei
    ;
    Dinh, Cong Que
    Proceedings paper
    2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981G
  • Loading...
    Thumbnail Image
    Publication

    Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects

    Rathsack, Benjamin
    ;
    Nafus, Kathleen  
    ;
    Hatakeyama, Shinichi
    ;
    Kuwahara, Yuhei
    ;
    Kitano, Junichi
    Proceedings paper
    2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727347

Follow imec on

VimeoLinkedInFacebook

The repository

  • Contact us
  • Policy
  • About imec
Privacy statement | Cookie settings