Browsing by Author "Kuwahara, Yuhei"
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Publication Advances and challenges in dual-tone development process optimization
Proceedings paper2009, Optical Microlithography XXII, 22/02/2009, p.72740IPublication Advances in dual-tone development for pitch frequency doubling
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.76400EPublication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
;Tadatomo, Hiroki ;Dauendorffer, Arnaud ;Onitsuka, Tomoya ;Genjima, HisashiIdo, YasuyukiProceedings paper2022, Conference on Advanced Etch Technology and Process Integration for Nanopatterning XI Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2020-2022, p.120560FPublication Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Proceedings paper2015, Advances in Patterning Materials and Processes XXXII, 22/02/2015, p.942516Publication EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
;Dinh, Cong Que ;Nagahara, Seiji ;Kuwahara, Yuhei ;Dauendorffer, ArnaudYoshida, KeisukeJournal article2022, JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, (35) 1, p.87-93Publication EUV patterning improvement toward high-volume manufacturing
Meeting abstract2015, Extreme Ultraviolet (EUV) Lithography VI, 22/02/2015, p.94221XPublication EUV process establishment through litho and etch for N7 node
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97760CPublication Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
Proceedings paper2008, Advances in Resist Materials and Processing Technology XXV, 24/02/2008, p.692315Publication Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Proceedings paper2014, Advances in Patterning Materials and Processes XXXI, 23/02/2014, p.905108Publication Novel metal containing resists for EUV lithography extendibility
Proceedings paper2016, Extreme Ultravioelt (EUV) Lithography, 21/02/2016, p.977606Publication Recent advances in EUV patterning in preparation towards high-NA EUV
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 124981GPublication Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Proceedings paper2009, Advances in Resist Materials and Processing Technology XXVI, 22/02/2009, p.727347